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Debate
Large Language Models for Plasma Research – Curse or Blessing?
A Debate-Article to appear in Plasma Processes and Polymers by Achim von Keudell, Ruhr University Bochum
Large language models (LLM) such as ChatGPT and others may change the way we do research. These systems serve as a tool for literature searches, data analysis and performing programming tasks. But what are the potentials of LLMs and their shortcomings, especially regarding the very interdisciplinary plasma research?
The advent of large language models (LLM) such as ChatGPT and others will change the way we gather, process and present scientific findings. LLMs are based on collecting information from the internet and composing answers based on the likelihood of succession of words. Thereby, the most common statements and phrases are amplified, hoping these common information pieces are correct. This might, however, not necessarily be true, and the amplification of wrong statements may distort any thorough assessment and analysis of a topic. This is referred to as the hallucination of LLMs [1]. The ease of gathering information and creating answers in a very readable form is a blessing; amplifying wrong statements is a curse. Some publishers have already discussed this in the community and are addressing it [1-5]. But what are the potentials of LLMs and their shortcomings, especially regarding plasma research?
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Paper
Publication on Methane Pyrolysis by S. Kreuznacht et al. was the most downloaded research paper in PPaP in 2023
The paper Comparison of the performance of a microwave plasma torch and a gliding arc plasma for hydrogen production via methane pyrolysis [RESEARCH ARTICLE] by Simon Kreuznacht et al, was the most downloaded research article in Plasma Processes and Polymers from 2022 and downloaded in 2023. Only one old review from 2007 got more downloads.
- Most Accessed 03/2023 to 02/2024 Plasma Processes and Polymers (wiley.com)
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Conference
DPG Spring Conference Greifswald
The groups EP2 and PIP contributed to the program of the DPG spring meeting in Greifswald with 3 invited talks, four contributed talks, and 6 posters to the scientific program.
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Publication
3d Etching of Silicon and Glasses
Three-dimensional (3D) etching of materials by plasmas is an ultimate challenge in microstructuring applications. A method is proposed to reach a controllable 3D structure by using masks in front of the surface in a plasma etch reactor in combination with local magnetic fields to steer the incident ions in the plasma sheath region towards the surface to reach 3D directionality during etching and deposition. This effect can be controlled by modifying the magnetic field and/or plasma properties to adjust the relationship between sheath thickness and mask feature size. Since the guiding length scale is the plasma sheath thickness, which for typical plasma densities is at least 10s of microns or larger, controlled directional etching and deposition target the field of microstructuring, e.g. of solids for sensors, optics, or microfluidics. In this proof-of-concept study, it is shown that E x B drifts tailor the local sheath expansion, thereby controlling the plasma density distribution and the transport when the plasma penetrates the mask during an RF cycle. This modified local plasma creates a 3D etch profile. This is shown experimentally as well as using 2d3v Particle-In-Cell/Monte Carlo collisions simulation.
Animated result of the PIC simulation covering one RF cycle for a bias voltage of -100 V and a magnetic field of 80 mT.
- Plasma sheath tailoring by a magnetic field for three-dimensional plasma etching
E. Jüngling, S. Wilczek, T. Mussenbrock, M. Böke, A. von Keudell
Appl. Phys. Lett. 12(7) (2024)
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Plasma School
Bad Honnef Plasma School 2023
The International School on Low-Temperature Plamsas and Applications was held in Bad Honnef again at the beginning of October.