Impact of the surface on He and He2 metastables densities in atmospheric pressure RF plasma S. Yu, L. Chauvet, A. von Keudell PSST (accepted)
Simulation of a microwave plasma torch used for hydrogen production via methane pyrolysis S. Kreuznacht, M. Böke, A. von Keudell Plasma Processes and Polymers 2024 (accepted)
A global plasma and surface model of hydrogen/methane inductively coupled discharge to analyze hydrocarbon plasma-surface interactions in Extreme-Ultra-Violet lithography machines, E. Kemaneci, A. von Keudell, L. Heijmans, A. Yakunin and M. van de Kerkhof J. Appl. Phys 2024 (accepted)
State enhanced actinometry in the COST microplasma jet D. Steuer, H. van Impel, A. R. Gibson, V. Schulz-von der Gathen, M. Böke, J. Golda Plasma Sources Sci. Technol. (2022) 31 10LT01 DOI: https://10.1088/1361-6595/ac90e8
Control of spoke movement in DCMS plasmas M. George, W. Breilmann, H. Held, A. von Keudell Plasma Sources Sci. Technol. 31 085004 (2022) DOI: https://doi.org/10.1088/1361-6595/ac830e
Determining Chemical Reaction Systems in Plasma-Assisted Conversion of Methane Using Genetic Algorithms Reiser, D; von Keudell, A and Urbanietz, T PLASMA CHEMISTRY AND PLASMA PROCESSING 41 (3) , pp.793-813
Reproducibility of 'COST reference microplasma jets F Riedel, J Golda, J Held, H L Davies, M W van der Woude, J Bredin, K Niemi, T Gans, V Schulz-von der Gathen and D O’Connell Plasma Sources Sci. Technol. 29 (2020) 095018 DOI: https://dx.doi.org/10.1088/1361-6595/abad01
3-dimensional density distributions of NO in the effluent of the COST Reference Microplasma Jet operated in He/N2/O2 P. Preissing, I. Korolov, J. Schulze, V. Schulz-von der Gathen, M. Böke Plasma Sources Sci. Technol. 29, 125001 (2020)
Chemistry in Nanosecond plasmas in water L. Chauvet, C. Nenbangkaeo, K. Grosse, A. von Keudell Plasma Processes and Polymers 201900192 (2019) DOI: https://doi.org/10.1002/ppap.201900192
Correlative plasma-surface model for metastable Cr-Al-N: Frenkel pair formation and influence of the stress state on the elastic properties Denis Music, Lars Banko, Holger Ruess, Martin Engels, Ante Hecimovic, Dario Grochla, Detlef Rogalla, Tobias Br¨ogelmann, Alfred Ludwig, Achim von Keudell Journal of Applied Physics 121, 215108 (2017)
Fundamental Study of an Industrial Reactive HPPMS (Cr,Al)N Process K. Bobzin, T. Brögelmann, N.C. Kruppe, M. Engels, A. von Keudell, A. Hecimovic, A. Ludwig, D. Grochla, L. Banko J. Appl. Phys. 122, 015302 (2017)
Pressure-reducing device, apparatus for mass spectrometric analysis of a gas and a cleaning method H.Y. Chung, M. Aliman, G. Fedosenko, R. Reuter, L. Gorkhover, P. Awakowicz, M. Böke, A. von Keudell, J. Winter, A. Laue, J. Benedikt Patent: WO2016/096233 A1 (2016), DE102014226038 A1 (2016)
Ionization device and mass spectrometer therewith M. Aliman, H.Y. Chung, G. Fedosenko, R. Reuter, A. Laue, A. von Keudell, M. Böke, T. Benter, J. Winter, P. Awakowicz, L. Gorkhov Patent: WO2016096457 A1 (2016), DE102014226039 A1 (2016)
Gepulste Hochleistungs-Magnetron-Plasmen (HPPMS), Kontrolle durch Überwachung der Strom-Spannungskennlinien Achim von Keudell, Ante Hecimovic, Christian Maszl Vakuum in Forschung und Praxis 28, 24 (2016)
Concepts and characteristics of the ''COST Reference Microplasma Jet'' J Golda, J Held, B Redeker, M Konkowski, P Beijer, A Sobota, G. Kroesen, N. Braithwaite, S. Reuter, M. Turner, T. Gans, D. OConnel, V. Schulz-von der Gathen J. Phys. D: Appl. Phys. 49, 084003 (2016) DOI: http://dx.doi.org/10.1088/0022-3727/49/8/084003
High power impulse sputtering of chromium: correlation between the energy distribution of chromium ions and spoke formation W Breilmann, A Eitrich, C Maszl, A Hecimovic, V Layes, J Benedikt, A. von Keudell J. Phys. D 48, 295202 (2015)
Mass spectrometry of atmospheric pressure plasmas S Große-Kreul, S Hübner, S. Schneider, D Ellerweg, A von Keudell, S Matejcik and J Benedikt, Plasma Sources Science and Technology 24, 044008 (2015), DOI: http://dx.doi.org/10.1088/0963-0252/24/4/044008
Spoke transitions in HiPIMS discharges A. Hecimovic, V. Schulz-von der Gathen, M. Böke, A. von Keudell Plasma Sources Science & Technology 24, 045005 (2015) DOI: http://dx.doi.org/10.1088/0963-0252/24/4/045005
Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces Grundmeier, Guido; von Keudell, Achim; de los Arcos, Teresa, PLASMA PROCESSES AND POLYMERS 12, 926-940 (2015)
Selbsttragende Spuleneinheit für eine Plasmaquelle, Verfahren zur Herstellung einer solchen Spuleneinheit und entsprechende Plasmaquelle P. Awakowicz M. Böke, J. Winter, A. von Ke Patent: DE102012109461 A1 (2014)
Adhesion of thin CVD films on pulsed plasma pre-treated polypropylene H. Behm, K. Bahroun, H. Bahre, F. Mitschker, N. Bibinov, M. Böke, R. Dahlmann, P. Awakowicz, Ch. Hopmann, and J. Winter Plasma Process. Polym. 11, (2014), 418-425 DOI: http://dx.doi.org/10.1002/ppap.201300128
The effect of surface reactions of O, O3 and N on film properties during the growth of silica-like films K Rügner, R Reuter, A von Keudell and J Benedikt, J. Phys. D: Appl. Phys. 47 224005 (2014)
Various Shapes of Plasma Spokes Observed in HiPIMS Hecimovic, Ante; von Keudell, Achim; Schulz-von der Gathen, Volker; Winter, Jörg IEEE TRANSACTIONS ON PLASMA SCIENCE 42, 2810-2811, (2014) DOI: http://dx.doi.org/10.1109/TPS.2014.2330454
Fast time resolved techniques as key to the understanding of energy and particle transport in HPPMS-plasmas C. Maszl, W. Breilmann, L. Berscheid, J. Benedikt, A. von Keudell IEEE Images in Plasma Science 42, 2810 (2014)
Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure Marinov, D.; Guaitella, O.; de los Arcos, T.; von Keudell, A JOURNAL OF PHYSICS D-APPLIED PHYSICS 47, 475204 (2014)
Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium C Maszl, W Breilmann, J Benedikt and A von Keudell J. Phys. D: Appl. Phys. 47 224002 (2014)
Monitoring particle growth in deposition plasmas T. Schlebrowski, H. Bahre, M. Böke, and J. Winter Plasma Sources Sci. Technol. 22, (2013), 065014 DOI: http://dx.doi.org/10.1088/0963-0252/22/6/065014
Current-voltage characteristics and fast imaging of HPPMS plasmas: transition from self-organized to homogeneous plasma regimes T. de los Arcos, V. Layes, Y. Aranda Gonzalvo, V. Schulz-von der Gathen, A. Hecimovic, and J. Winter Journal of Physics D: Applied Physics. 46, 335201 (2013)
Target implantation and redeposition processes during high power impulse magnetron sputtering of aluminium, A. Will, T. de los Arcos, M. Prenzel, J. Winter, A. von Keudell, J. Appl. Phys. 46, 084009, (2013)
Time resolved measurement of film growth during HPPMS of titanium F. Mitschker, M. Prenzel, J. Benedikt, A. von Keudell J. Appl. Phys. D 46, 155204 (2013)
Ionization coefficients for argon in a micro-discharge Thomas Kuschel, Ilija Stefanovic, Gordana Malovic, Dragana Maric and Zoran Lj Petrovic Plasma Sources Sci. Technol. 22 (2013) 045001 2900
Enhanced oxygen dissociation in a propagating constricted discharge formed in a self-pulsing atmospheric pressure microplasma jet Daniel Schröder, Sebastian Burhenn, Dennis Kirchheim and Volker Schulz-von der Gathen J. Phys. D: Appl. Phys. 46 ( 2013 ) 464003
Time resolved measurement of film growth during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride, F. Mitschker, M. Prenzel, C. Maszl, J. Benedikt, A. von Keudell J. Phys D 46, 495201 (2013)
Dynamic of the growth flux at the substrate during high power pulsed magnetron sputtering (HiPIMS) of titanium W. Breilmann, C. Maszl, J. Benedikt, A. von Keudell, J. Phys. D 46, 485204 (2013)
Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure K. Ruegner, R. Reuter, D. Ellerweg, A. von Keudell, J. Benedikt. Plasma Processes and Polymers 10, 1061-1073 (2013)
2012
Durchbruch für die Plasmasterilisation P. Awakowicz, A. von Keudell, M. Böke, J. Winter, W. Novak, E. Semmler, R. Schmelzle Medizin & Technik - Ingenieurwissen für die Medizintechnik, 03/2012 (2012), 26-27
Functional plasma polymers deposited in capacitivley and inductively couped plasmas D. Hegeman, E. Koerner, C. Shang, J. Benedikt, A. von Keudell Appl. Phys. Lett. 100, 051601 (2012)
Unexpected O and O3 production in the effluent of He/O2 microplasma jets emanating into ambient air D. Ellerweg, A. von Keudell and J. Benedikt Plasma Sources Science and Technol. 21, 034019 (2012)
The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure Rüdiger Reuter, Katja Rügner, Dirk Ellerweg, Teresa de los Arcos, Achim von Keudell, Jan Benedikt Plasma Processes and Polymers (2012) DOI: 10.1002/ppap.201100146
Quadrupol Masspectrometry of Reactive Plasmas (review) J. Benedikt, D. Ellerweg, A. Hecimovic, A. von Keudell J. Phys. D 45, 403001 (2012)
Chemical and Physical Sputtering of PET S. Große-Kreul, C. Corbella, A. von Keudell Plasma Processes and Polymers DOI 10.1002/201200094 (2012) DOI: http://dx.doi.org/10.1002/ppap.201200094
Time resolved measurement of film growth during HPPMS of titanium: the rotating shutter concept F. Mitschker, M. Prenzel, J. Benedikt, A. von Keudell J. Phy. D Fast Track Communications 45, 4020001 (2012)
Atomic oxygen in a cold argon plasma Jet: TALIF spectroscopy in ambient air with modelling and measurements of ambient species diffusion S Reuter, J Winter, A Schmidt-Bleker, D Schroeder, H Lange, N Knake, V Schulz-v.d.Gathen, K-D Weltmann Plasma Sources Sci. Technol. 21 (2012) 024005
Influence of target surfaces on the atomic oxygen distribution in the effluent of a micro-scaled atmospheric pressure plasma jet D Schröder, H Bahre, N Knake, J Winter, T de los Arcos and V Schulz-von der Gathen Plasma Sources Sci. Technol. 21 (2012) 024007
Embedded argon as a tool for sampling local structure in thin plasma deposited aluminum oxide films, M. Prenzel, A. Kortmann, T. de los Arcos, J. Winter, A. von Keudell, J. Appl. Phys 45, 103306 (2012)
2011
X-ray photoelectron spectroscpy on imlanted argon as a tool to follow local structral changes in thin films A. Rastgoo, T. de los Arcos, M. Prenzel, A. von Keudell, J. Winter Thin Solid Films 520, 1625 (2011)
Surface reactions as carbon removal mechanism in deposition of silicon dioxide films at atmospheric pressure R. Reuter, D. Ellerweg, A. von Keudell, J. Benedikt Appl. Phys. Lett. 98, 111502 (2011)
Oscillation modes of dc microdischarges with parallel-plate geometry Ilija Stefanovic, Thomas Kuschel, Nikola Zkoro, Dragana Maric, Zoran Lj Petrovic and Jörg Winter J. Appl. Phys. vol. 110, Issue 8, 083310
Excitation dynamics of a kHz driven micro-structured plasma channel device operated in argon A Greb, H Boettner, J Winter and V Schulz-von der Gathen Plasma Sources Sci. Technol. 20 (2011) 055010
The role of VUV radiation in the inactivation of bacteria with an atmospheric pressure plasma jet S. Schneider, J.-W. Lackmann, D. Ellerweg, B. Denis, F. Narberhaus, J.E. Bandow, J. Benedikt Plasma Process. Polym. (2011) accepted
Separation of VUV/UV photons and reactive particles in the effluent of a He/O2 atmospheric S. Schneider, J.-W. Lackmann, F. Narberhaus, J. E. Bandow, B. Denis, J. Benedikt J. Phys. D: Appl. Phys. 44 (2011) 295201
Spatiotemporal profile of emission from oscillating dc microdischarges T. Kuschel, I. Stefanovic, N. Zkoro, D. Maric, G. Malovic, J. Winter, Z. Lj. Petrovic IEEE Trans. Plasma Sci., Spec. Issue on Images in Plasma Sci.
Vacuum Ultraviolet (VUV) Emission of an Atmospheric Pressure Plasma Jet (micro-APPJ) Operated in Helium-Oxygen Mixtures in Ambient Air H. Bahre, H.Lange, V. Schulz-von der Gathen, R. Foest Acta Technica, 56 (2011) T199
2010
A Physicist’s Perspective on “Views on Macroscopic Kinetics of Plasma Polymerisation” A. von Keudell, J. Benedikt Plasma Processes and Polymers 7, (2010)
Elimination of biological contaminations from surfaces by plasma discharges: the importance of chemical sputtering H. Rauscher, O. Kylian, J. Benedikt, A. von Keudell, F. Rossi Chem Phys. Chem. 11, 1382 (2010)
Fundamental aspects of substrate biasing: ion velocity distributions and nonlinear effects T. Baloniak, R. Reuter, A. von Keudell J. Phys. D 43, 335201 (2010)
Calibration of a miniaturized retarding field analyzer for low-temperature plasmas: geometry and collisional effects T. Baloniak, R. Reuter, C. Flötgen, A. von Keudell J. Phys. D 43, 55203 (2010)
Ion-enhanced oxidation of aluminium as a fundamental surface process during target poisoning in reactive magnetron sputtering Thomas Kuschel and Achim von Keudell Journal of Applied Physics 107, 103302 (2010)
Inactivation of bacteria and biomolecules using low pressure plasma discharges (BIODECON review) A. von Keudell, P. Awakwowicz, J. Benedikt, V. Raballand, A. Yanguas-Gil, J. Opretzka, C. Flötgen, R. Reuter L. Byelykh, H. Halfmann, K. Stapelmann, B Plasma Processes and Polymers 7, 327 (2010)
Chaotic behavior of dc microdischarges with parallel-plate geometry Ilija Stefanovic, Nikola Zkoro, Dragana Maric and Zoran Lj. Petrovic 20th ESCAMPIG, 13-17 July 2010, Novi Sad, Serbia P3.41
Gas flow dependence of ground state atomic oxygen in plasma needle discharge at atmospheric pressure Yukinori Sakiyama, Nikolas Knake, Daniel Schröder, Jörg Winter, Volker Schulz-von der Gathen, and David B. Graves Appl. Phys. Lett. 97 (2010) 151501
Phase resolved optical emission spectroscopy of coaxial microplasma jet operated with He and Ar J. Benedikt, S. Hofmann, N. Knake, H. Böttner, R. Reuter, A. von Keudell, and V. Schulz-von der Gathen Eur. Phys. J. D (2010) 60 539
Atomic oxygen formation in a radio-frequency driven micro-atmospheric pressure plasma jet J Waskoenig, K Niemi, N Knake, L M Graham, S Reuter, V Schulz-von der Gathen and T Gans Plasma Sources Sci. Technol. 19 (2010) 045018
Excitation dynamics of micro-structured atmospheric pressure plasma arrays H. Boettner, J. Waskoenig, T. L. Kim, P. A. Tchertchian, D. O'Connell, J. Winter, and V. Schulz-von der Gathen J. Phys. D: Appl. Phys. 43, (2010) 124010
Investigations of the spatio-temporal build-up of atomic oxygen inside the micro-scaled atmospheric pressure plasma jet N. Knake and V. Schulz-von der Gathen Eur. Phys. J. D 60, (2010) 645
Characterization of the effluent of a He/O2microscale atmospheric pressure plasma jet by quantitative molecular beam mass spectrometry D. Ellerweg, J. Benedikt and A von Keudell N. Knake and V. Schulz-von der Gathen New J. Physics 12, 013021 (2010)
The challenge of revealing and tailoring the dynamics of radio-frequency plasmas T. Gans, D. O'Connell, V. Schulz- von der Gathen, and J. Waskoenig Plasma Sources Sci. Technol. 19, (2010) 034010
Investigations on the Generation of Atomic Oxygen Inside a Capacitively Coupled Atmospheric Pressure Plasma Jet N. Knake, D. Schröder, J. Winter and V. Schulz-von der Gathen J. Phys.: Conference Series 227 (2010) 012020
Diagnostic based modelling of radio-frequency driven atmospheric pressure plasmas K. Niemi, S. Reuter, L.M. Graham, J. Waskoenig, N. Knake, V. Schulz-von der Gathen, and T. Gans J. Phys. D: Applied Physics 43 (2010) 124006
The role of C2H4 for the acetylene chemistry in particle forming Ar/He/C2H2 plasma studied via quantitative mass spectrometry A. Consoli, J. Benedikt, A. von Keudell Plasma Sources Science and Technology 18, 34004 (2009)
Removal of model proteins using beams of argon ions and of oxygen atoms and molecules: mimicking the action of low-pressure Ar/O2 ICP discharges O. Kylián, J. Benedikt, L. Sirghi, R. Reuter, H. Rauscher, A. von Keudell and F. Rossi Plasma Processes and Polymers 6, 255 (2009)
Thin film growth from a low pressure plasma excited in a supersonic expanding gas jet C. Wachtendorf, C. Herweg, M. Daeuber, J. Benedikt, A. von Keudell 78 J. Phys. D 42, 95205 (2009)
Molecular beam sampling system with very high beam-to-background ratio: the rotating skimmer concept J. Benedikt, D. Ellerweg, A. von Keudell Review of Scientific Instruments 80, 55107 (2009)
Deposition of silicon dioxide using an atmospheric microplasma jet V. Raballand, J. Benedikt, M. Zimmermann, A. von Keudell J. Appl. Phys. 105, 83304 (2009)
Development of an in-situ ellipsometer for the use at the first wall of a tokamak T. Dittmar, A. von Keudell, A. Kreter Nuclear Fusion 49, 045004 (2009)
2008
Etching of Bacillus atrophaeus by oxygen atoms, molecules and argon ions J. Benedikt, C. Flötgen, G. Kussel, V. Raballand, A. von Keudell J. Phys. Conference Series 133, 012012 (2008)
Initial polymerization reactions in particle forming Ar/He/C2H2 plasmas studied via quantitative mass spectrometry A. Consoli, J. Benedikt, A. von Keudell J. Phys. Chem. A 112, 11319 (2008)
Inactivation of Bacillus Atrophaeus and of Aspergillus Niger using beams of argon ions, of oxygen molecules and of oxygen atoms V. Raballand, J. Benedikt, J. Wunderlich, A. von Keudell J. Phys. D 41, 115207 (2008)
Anomalous roughness scaling of well-ordered amorphous fuorocarbon films deposited from a dusty octafluorocyclobutane plasma T. Baloniak, A. von Keudell Plasma Processes and Polymers 5, 653 (2008)
Deposition of carbon free silicon dioxide from pure hexamethyldisiloxane using an atmospheric microplasma jet V. Raballand, J. Benedikt, A. von Keudell Appl. Phys. Lett. 92, 91502, (2008)
Spatial dynamics of the light emission from a microplasma array J. Waskoenig, D. O'Connell, V. Schulz-von der Gathen, J. Winter, S.J. Park, and J.G. Eden, Appl. Phys. Lett. 92, (2008) 101503
Absolute atomic oxygen density profiles in the discharge core of a micro scale atmospheric pressure plasma jet Nikolas Knake, Kari Niemi, Stephan Reuter, Volker Schulz-von der Gathen, and Jörg Winter Appl. Phys. Lett. 93, (2008) 131503
Thin film deposition by means of atmospheric pressure microplasmas J. Benedikt, V. Raballand A. Yanguas-Gil, K. Focke, A. von Keudell Plasma Physics and Controlled Fusion 49, 419 (2007)
Time resolved molecular beam mass spectrometry of the initial stage of particle formation in an Ar/He/C2H2 plasma J. Benedikt, A. Consoli, M. Schulze, A. von Keudell J. Phys. Chem. A 111, 10453 (2007)
Rotation of a Nanoparticle Cloud in an Inductively Coupled Plasma induced by weak static magnetic fields M. Schulze, D. O’Connell, T. Gans, A. von Keudell, P. Awakowicz Plasma Sources Science and Technology 16, 774 (2007)
A robust method to calculate metastable and resonant state densities from emission spectra in argon plasmas M. Schulze, A. Yanguas-Gil, A. von Keudell, P. Awakowicz J. Phys. D 41, 65206 (2007)
Heating of a dual frequency capacitively coupled plasma via the plasma series resonance E. Semmler, P. Awakowicz, A. von Keudell Plasma Sources Science and Technology 16, 839 (2007)
The role of Chemical Sputtering during plasma sterilization of bacillus atrophaeus J. Opretzka, J. Benedikt, P. Awakowicz, J. Wunderlich, A. von Keudell J. Physics D 40, 2826 (2007)
Optical and Electrical Characterization of a microplasma jet operated at atmospheric pressure A. Yanguas-Gil, K. Focke, J. Benedikt, A. von Keudell J. Appl. Phys. 101, 103307 (2007)
The search for growth precursors in reactive plasmas: from nanoparticles to microplasmas A. von Keudell, I. Kim, A. Consoli, M. Schulze, A. Yanguas-Gil, J. Benedikt Plasma Sources Sci. Technol. 16, S94 (2007)
Atmospheric microplasma jet source as depositing tool J. Benedikt, K. Focke, A. Yanguas-Gil, A- von Keudell Appl. Phys. Lett. 89, 251504 (2006)
Roughness evolution during growth of a-C:H films in methane plasmas I. Kim, S. Hong, A. Consoli, J. Benedikt, A. von Keudell J. Appl. Phys. 100, 53302 (2006)
Controlled Particle Formation in an inductively coupled Plasma M. Schulze, A. von Keudell, P. Awakowicz Appl. Phys. Lett. 88, 141503 (2006)
Characterization of a rotating nanoparticles cloud in inductively coupled plasma M. Schulze, A. von Keudell, P. Awakowicz Plasma Sources Science and Technol. 15, 556 (2006)
Modelling of pulsed low-pressure plasmas and comparison with measurements in inductive discharges G. Wenig, M. Schulze, P. Awakowicz, A. von Keudell Plasma Sources Sci. and Technol. 15, S35 (2006)
2005
Wettabilities of plasma deposited polymer films K. Kutasi, N. Bibinov, A. von Keudell, K. Wiesemann J. Optoelectronics and Advanced Materials 7, 2549 (2005)
Growth precursor in a pulsed inductively coupled methane plasma M. Bauer, T. Schwarz-Selinger, W. Jacob, A. von Keudell J. Appl. Phys. 98, 073302 (2005)
Plasma chemistry of a pulsed inductively coupled methane plasma M. Bauer, T. Schwarz-Selinger H. Kang, A. von Keudell Plasma Sources Sci. Technol. 14, 543 (2005)
Ion-induced surface activation and hydrogen release during plasma-assisted hydrocarbon film growth C. Hopf, W. Jacob, A. von Keudell J. Appl. Phys. 97, 94904 (2005)
2004
Elementary processes in plasma-surface interaction:H-atom and ion-induced chemisorption of methyl on hydrocarbon filmsurfaces (review) A. von Keudell, W. Jacob Progress in Surface Science 26, 21-54 (2004)
Particle induced oscillations in inductively coupled plasmas A. von Keudell, M. Bauer Plasma Sources Sci. Technol. 13, 1 (2004)
2003
Particle beam experiment to study heterogeneous surface reactions relevant to plasma-assisted thin film growth and etching W. Jacob, C. Hopf, A. von Keudell, M. Meier, T. Schwarz-Selinger Rev. Sci. Instr. 74, 5123 (2003)
Direct verification of the ion-neutral synergism during hydrocarbon film growth C. Hopf, A. von Keudell, W. Jacob J. Appl. Phys. 93, 3352 (2003)
The influence of hydrogen ion bombardment on plasma-assisted hydrocarbon film growth C. Hopf, A. von Keudell, W. Jacob Diamond and Related Materials 12, 85 (2003)
Consequences of the Temperature and flux dependent sticking coeffcient of CH3 for nuclear fusion M. Meier, A. von Keudell, W. Jacob Nucl. Fusion 43, 25 (2003)
Chemical Sputtering of C:H films C. Hopf, A. von Keudell, W. Jacob J. Appl. Phys. 94, 2373 (2003)
Characterization of deposited hydrocarbon layers below the divertor and in the pumping ducts of ASDEX Upgrade M. Mayer, V. Rohde, A. von Keudell, and the ASDEX Upgrade team J. Nucl. Mater. 313-316, 429 (2003)
Can plasma experiments unravel microscopic surface processes in thin film growth and erosion ? – Implications of particle-beam experiments on the unde T. Schwarz-Selinger, M. Meier, C. Hopf, A. von Keudell, and W. Jacob Vacuum 71, 361 (2003)
Chemical Sputtering of C:H films by low energy argon ion and H atom impact C. Hopf, A. von Keudell, W. Jacob Nuclear Fusion 42, L27 (2002)
Growth Mechanisms of amorphous hydrogenated carbon A. von Keudell, M. Meier, C. Hopf Diamond and Related Materials 11, 969 (2002)
Temperature dependence of the methyl sticking coefficient on hydrocarbon film surfaces M. Meier, A. von Keudell J. Chem. Phys. 116, 5125 ( 2002)
Formation of polymer-like hydrocarbon films from radical beams of methyl and atomic hydrogen (invited review) A. von Keudell Thin Solid Films 402, 1 (2002)
2001
Hydrogen elimination as a key step for the formation of polymer-like hydrocarbon films M. Meier, A. von Keudell J. Appl. Phys. 90, 3585 (2001)
Simultaneous interaction of methyl radicals and atomic hydrogen with amorphous hydrogenated carbon films, as investigated with optical in situ diagnos A. von Keudell, M. Meier, T. Schwarz-Selinger Appl. Phys. A72, 551 (2001)
Surface reactions of hydrocarbon radicals: suppression of the re-deposition in fusion experiments via a divertor liner A. von Keudell, T. Schwarz-Selinger, W. Jacob, A. Stevens J. Nucl. Mater. 290-293, 231 (2001)
Simultaneous interaction of methyl radicals and atomic hydrogen with amorphous hydrogenated carbon films A. von Keudell, T. Schwarz-Selinger, W. Jacob J. Appl. Phys. 89, 2979 (2001)
Quantification of a radical beam source for methyl radicals T. Schwarz-Selinger, V. Dose, W. Jacob, A. von Keudell J. Vac. Sci. Technol. A 19, 101 (2001)
2000
Infrared Analysis of thin films: amorphous, hydrogenated carbon on silicon W. Jacob, A. von Keudell, T. Schwarz-Selinger Brazilian Journal of Physics 30, 508 (2000)
Thermal conductivity of amorphous carbon thin films A. J. Bullen, K. E. O'Hara, D. G. Cahill, O. Monteiro, A. von Keudell J. Appl. Phys. 88, 6317 (2000)
Surface processes during thin film growth, Tutorial for the ERASMUS Summer School on low temperature plasma physics A. von Keudell Plasma Sources Science and Technology 9, 455-467 (2000)
A novel method for the absolute quantification of the flux and angular distribution of a radical source for atomic hydrogen T. Schwarz-Selinger, A. von Keudell, W. Jacob J. Vac. Sci. Technol. A 18, 995 (2000)
Direct identification of the synergism between methyl radicals and atomic hydrogen during growth of amorphous hydrogenated carbon films A. von Keudell , T. Schwarz-Selinger, M. Meier, W. Jacob Appl. Phys. Letters. 76(6):676-678, (2000) corrigendum, Appl. Phys. Lett. 77, 459 (2000)
Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces C. Hopf, T. Schwarz-Selinger, W. Jacob, A. von Keudell J. of Appl. Physics. 87(6):2719-2725, (2000)
1999
Modulation Instabilities of Surface-Wave Sustained Discharges M. Böke, D. Grozev, G. Himmel, K. Kirov, H. Schlüter and A. Shivarova Advanced Technologies based on Wave and Beam generated Plasmas, ed. by H. Schlüter and A. Shivarova , NATO Science Series vol. 67 (1999) 505, ISBN 0-
Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces: consequences for the formation of re-deposited laye A. von Keudell, C. Hopf, T. Schwarz-Selinger, W. Jacob Nuclear Fusion. 39(10):1451-1462, (1999)
Surface loss probabilities of the dominant neutral precursors for film growth in methane and acetylene discharges C. Hopf, K. Letourneur, W. Jacob, T. Schwarz-Selinger, A. von Keudell Appl. Phys. Lett. 74, 3800 (1999)
Plasma chemical vapor deposition of hydrocarbon films: the influence of hydrocarbon source gas on the film properties T. Schwarz-Selinger, A. von Keudell, W. Jacob J. Appl. Phys. 86, 3988 (1999)
Erosion of Thin Hydrogenated Carbon Films in Oxygen, Oxygen/Hydrogen and Water Plasmas B. Landkammer, A. von Keudell, W. Jacob J. Nucl. Mater. 264, 48 (1999)
Direct insertion of SiH3 radicals into strained Si-Si surface bonds during plasma deposition of hydrogenated amorphous silicon films A. von Keudell, J.R. Abelson Phys. Rev. B. 59, 5791 (1999)
Thermally induced changes in the hydrogen microstructure of a-Si:H, analyzed using in situ real time infrared spectroscopy A. von Keudell, J.R. Abelson Jpn. J. Appl . Phys. 38, 4002 (1999)
1998
Structure of plasma-deposited amorphous hydrogenated boron-carbon thin films A. Annen, M. Saß, R. Beckmann, A. von Keudell, W. Jacob Thin Solid Films 312, 147 (1998)
The interaction of atomic hydrogen with very thin amorphous hydrogenated silicon films analyzed using in situ real time infrared spectroscopy: reactio A. von Keudell, J.R. Abelson J. App. Phys. 84, 489 (1998)
1997
Evidence for atomic H insertion into strained Si-Si bonds in the amorphous hydrogenated silicon sub-surface from in situ infrared spectroscopy Achim von Keudell, J.R. Abelson Appl. Phys. Lett. 71, 3832 (1997)
Surface relaxation during plasma chemical vapor deposition of diamond-like carbon films, investigated by in situ ellipsometry A. von Keudell, T. Schwarz-Selinger, W. Jacob Thin Solid Films 308-309, 195 (1997)
Multivariate analysis of noise corrupted PECVD data A. von Keudell, A. Annen, V. Dose Thin Solid Films 307, 65 (1997)
Surface reactions during plasma enhanced chemical vapor deposition of hydrocarbon films A. von Keudell Nucl. Instr. Mat. B125, 323 (1997)
The interaction of hydrogen plasmas with hydrocarbon films, investigated by infrared spectroscopy using an optical cavity substrate A. von Keudell, W. Jacob J. Vac. Sci. Technol. A15, 402 (1997)
Surface relaxation during plasma enhanced chemical vapor deposition of a-C:H films, investigated by in situ ellipsometry A. von Keudell, W. Jacob J. Appl. Phys. 81, 1531 (1997)
1996
Erosion of amorphous hydrogenated boron-carbon thin films A. Annen, A. von Keudell, W. Jacob Journal of Nuclear Mat. 231, 151 (1996)
Secondary Electron Emission Coefficient of C:H and Si:C Thin Films and Some Relations to their Morphology and Composition S. Groudeva--Zotova, W. Jacob, and A. von Keudell Diam.Rel.Mater. 5, 1087 (1996)
Growth and Erosion of Hydrocarbon films, investigated by in-situ ellipsometry A. von Keudell, W. Jacob J. Appl. Phys. 79, 1092 (1996)
1995
Mechanisms of the deposition of hydrogenated carbon films W. Möller, W. Fukarek, K. Lange, A. v. Keudell, W. Jacob Jpn. J. Appl. Phys. 34, 2163 (1995)
The role of ions for the deposition of hydrocarbon films, investigated by in-situ ellipsometry A. von Keudell MRS-Proceedings, Spring ‘95, ed. H.A. Atwater, D.H. Lowdnes, J.T. Dickinson, A. Polman.
The role of hydrogen ions during plasma enhanced chemical vapour deposition of hydrocarbon films, investigated by in-situ ellipsometry A. von Keudell, W. Jacob, W. Fukarek Appl. Phys. Lett. 66, 1322 (1995)
A novel set-up for spectroscopic ellipsometry and an example for its application W. Fukarek, A. von Keudell Rev. Sci. Instr. 66, 3545 (1995)
1994
A combined plasma-surface model for the deposition of C:H films from a methane plasma A. von Keudell, W. Möller J. Appl. Phys. 75, 7718 (1994)
1993
Moving-coil waveguide discharge for inner coating of metal tubes R. Hytry, W. Möller, R. Wilhelm, A. von Keudell J. Vac. Sci. Technol. A11(5), 2508 (1993)
Deposition of dense C:H-films at elevated substrate temperature A. von Keudell, W. Möller, R. Hytry Diamond and Related Materials 2, 251 (1993)
Deposition of dense hydrocarbon films from a nonbiased microwave plasma A. von Keudell, W. Möller, R.Hytry Appl. Phys. Lett. 62, 937 (1993)
1992
1991
Funktion A. von Keudell Amstrad PC International 70 - 6/7