Publications

2024

• Plasma in Liquids induced modification of Cu surfaces
  P. Pottkämper, A. von Keudell
  J. Phys. D (2024) accepted
  DOI:
  
• Ammonia synthesis by plasma catalysis in an atmospheric RF helium plasma
  S.C.L. Vervloedt, A. von Keudell
  Plasma Sources Sci. Technol (2024) (accepted)
  DOI:
  
• Controlled synthesis of NO in an Atmospheric Pressure Plasma by suppressing NO destruction channels by plasma catalysis
  S. Yu, S.C.L. Vervloedt, A. von Keudell
  J. Phys D (accepted)
  DOI:
  
• Large Language Models for Plasma Research – Curse or Blessing?
  A. von Keudell
  Plasma Processes and Polymers e202400066, (2024)
  DOI: https://doi.org/10.1002/ppap.202400066
  
• Plasma sheath tailoring by a magnetic field for three-dimensional plasma etching
  E. Jüngling, S. Wilczek, T. Mussenbrock, M. Böke, A. von Keudell
  Appl. Phys. Lett. 12(7) (2024)
  DOI: https://doi.org/10.1063/5.0187685
  
• PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth
  T. de los Arcos, P. Awakowicz, J. Benedikt, B. Biskup, M. Boeke, N. Boysen, R. Buschhaus, R. Dahlmann, A. Devi, T. Gergs, J. Jenderny, A. von Keudell, T. D. Kuehne, S. Kusmierz, H. Mueller, T. Mussenbrock, J. Trieschmann, D. Zanders
  Plasma Processes Polym. 2024, vol. 21, eLoc. 2300150
  DOI: https://doi.org/10.1002/ppap.202300150
  

2023

• Azimuthal ion movement in HiPIMS plasmas - Part II: lateral growth fluxes
  Steffen Schüttler, Sascha Thiemann-Monje, Julian Held, Achim von Keudell
  Plasma Sources Sci. Technol. 32, 105008 (2023)
  DOI: https://doi.org/10.1088/1361-6595/acfe94
  
• Azimuthal ion movement in HiPIMS plasmas - Part I: velocity distribution function
  S. Thiemann-Monjé, J Held, S Schüttler, A von Keudell, V Schulz-von der Gathen
  Plasma Sources Sci. Technol 32, 105007 (2023)
  DOI: https://doi.org/10.1088/1361-6595/acfe95
  
• Impact of catalysis on n-butane oxidation in an RF atmospheric pressure plasma
  C. Stewig, L. Chauvet, A. von Keudell
  Plasma Sources Sci. Technol 32, 105006 (2023)
  DOI: https://iopscience.iop.org/article/10.1088/1361-6595/acff17
  
• Surface dielectric barrier discharge (sDBD) for flow control in plasma conversion
  S. Mosenimehr, A. von Keudell
  Plasma Chemistry Plasma Processing 43, 1633–1649 (2023)
  DOI: https://doi.org/10.1007/s11090-023-10405-z
  
• Plasma deposited carbon containing zirconia films as thermal barriers
  V. Bedarev, P. Maass, M. Böke, A. von Keudell
  J. Vac. Sci. Technol. A 41, 0002745 (2023)
  DOI: https://doi.org/10.1116/6.0002745
  
• Ionization of sputtered material in high power impulse magnetron sputtering plasmas - comparison of titanium, chromium and aluminum
  J. Held, V. Schulz von der Gathen, A. von Keudell
  Plasma Sources Science and Technology 32, 65006 (2023)
  DOI: https://doi.org/10.1088/1361-6595/acd8eb
  
• The impact of plasma enhancement on the deposition of carbon containing zirconia films by metalorganic chemical vapor deposition
  P. Mass, V. Bedarev, L. Chauvet, M. Prenzel, J. Glauber, A. Devi, M. Böke, A. von Keudell
  Plasma Processes and Polymers 20, e2300050, (2023)
  DOI: https://doi.org/10.1002/ppap.202300050
  
• Secondary electron emission from magnetron targets
  R. Buschhaus, A. von Keudell
  Plasma Sources Science and Technol. 32, 65007 (2023)
  DOI: https://doi.org/10.1088/1361-6595/acd57e
  

2022

• State enhanced actinometry in the COST microplasma jet
  D. Steuer, H. van Impel, A. R. Gibson, V. Schulz-von der Gathen, M. Böke, J. Golda
  Plasma Sources Sci. Technol. (2022) 31 10LT01
  DOI: https://10.1088/1361-6595/ac90e8
  
• Electric Field strengths within a micro cavity plasma array measured by Stark shift and splitting of a Helium line pair
  S. Dzikowski, D. Steuer, S. Iseni, J. Golda, M. Böke, V. Schulz-von der Gath
  Plasma Sources Sci. Technol. 31 (2022), 065014
  DOI: https://doi.org/10.1088/1361-6595/ac7820
  
• The effects of the driving frequencies on micro atmospheric pressure He/N2 plasma jets driven by tailored voltage waveforms
  G. Hübner, L. Bischoff, I. Korolov, Z. Donko, M. Leimkühler, Y. Liu, M. Böke, V. Schulz-von der Gathen, T. Mussenbrock, J. Schulze
  J. Phys. D: Appl. Phys. 55 (2022), 095204
  DOI: https://doi.org/10.1088/1361-6463/ac3791
  
• Comparison of the Performance of a Microwave Plasma Torch and a Gliding Arc Plasma for the Hydrogen Production via Methane Pyrolysis
  S. Kreuznacht, M. Purcel, S. Böddecker, W. Xia, P. Awakowicz, M. Muhler, M. Böke, A. von Keudell
  Plasma Process. Polym. (2022), e202200132
  DOI: https://doi.org/10.1002/ppap.202200132
  
• Spoke-resolved electron density, temperature and potential in direct current magnetron sputtering and HiPIMS discharges
  J. Held, M. George, A. von Keudell
  Plasma Sources Sci. Technol (2022) 31 085013
  DOI: https://doi.org/10.1088/1361-6595/ac87ce
  
• Control of spoke movement in DCMS plasmas
  M. George, W. Breilmann, H. Held, A. von Keudell
  Plasma Sources Sci. Technol. 31 085004 (2022)
  DOI: https://doi.org/10.1088/1361-6595/ac830e
  
• Foundations of physical vapor deposition with plasma assistance
  J.T. Gudmundsson, A. Anders, A. von Keudell
  Plasma Sources Sci. Technol (2022) 31 083001
  DOI: https://doi.org/10.1088/1361-6595/ac7f53
  
• Propagation of nanosecond plasmas in liquids - streamer velocities and streamer lengths
  E. Jüngling, K. Grosse, A. von Keudell
  JVSTA 40, 043003 (2022)
  DOI: https://doi.org/10.1116/6.0001669
  
• Ion-induced secondary electron emission of oxidized nickel and copper studied in beam experiments
  R. Buschhaus, M. Prenzel, A. von Keudell
  Plasma Sources Science and Technol. 31, 025017 (2022)
  DOI: https://doi.org/10.1088/1361-6595/ac4c4c
  

2021

• Zero-dimensional and pseudo-one-dimensional models of atmospheric-pressure plasma jet in binary and ternary mixtures of oxygen and nitrogen with helium background
  Y. He, P. Preissing, D. Steuer, V. Schulz-von der Gathen, M. Böke, I. Korolov, J. Schulze, V. Guerra, R.P. Brinkmann, E. Kemaneci
  Plasma Sources Sci. Technol. 30 (2021), 0105017
  DOI: https://doi.org/10.1088/1361-6595/ac278d
  
• Determining Chemical Reaction Systems in Plasma-Assisted Conversion of Methane Using Genetic Algorithms
  Reiser, D; von Keudell, A and Urbanietz, T
  PLASMA CHEMISTRY AND PLASMA PROCESSING 41 (3) , pp.793-813
  DOI:
  
• Synchronising optical emission spectroscopy to spokes in magnetron sputtering discharges
  Philipp Alexander Maaß, Volker Schulz-von der Gathen, Achim von Keudell and Julian Held
  Plasma Sources Science and Technology 30, 125006 (2021)
  DOI: https://iopscience.iop.org/article/10.1088/1361-6595/ac3210
  
• 2d spatially resolved O atom density profiles in an atmospheric pressure plasma jet: from the active plasma volume to the effluent
  D. Steuer, I. Korolov, S. Chur, J. Schulze, V. Schulz-von der Gathen, J. Golda, M. Böke
  J. Phys. D: Applied Phys. 54, 355204 (2021)
  DOI: https://doi.org/10.1088/1361-6463/ac09b9
  
• Ignition and propagation of nanosecond pulsedplasmas in distilled water - negative vs. positive polarity applied to a pin electrode
  K. Grosse, M. Falke, A. von Keudell
  Journal of Applied Physics 129, 213302 (2021)
  DOI: https://doi.org/10.1063/5.0045697
  
• Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering
  P. Moskovkin, C. Maszl, W. Breilmann, J. Petersen, A. Pflug, R. Schierholz, J. Muller, S. Lucas, A. von Keudell
  Surfaces Coating Technologies 418, 127235 (2021)
  DOI: https://doi.org/10.1016/j.surfcoat.2021.127235
  
• Dedicated setup to isolate plasma catalysis mechanisms
  C. Stewig, T. Urbanietz, L. Chauvet, M. Böke, A. von Keudell
  J. Phys. D 54, 124005 (2021)
  DOI: https://doi.org/10.1088/1361-6463/abd65b
  
• Oxygen removal from a hydrocarbon containing gas stream by plasma catalysis
  T. Urbanietz, C. Stewig, M. Böke, A. von Keudell
  Plasma Chemistry Plasma Processing 41, 619 (2021)
  DOI: https://link.springer.com/article/10.1007/s11090-020-10151-6
  
• Intra-cavity Dynamics in a Microplasma Channel by Side-on Imaging
  Kreuznacht, Simon; Böke, Marc; Schulz-von der Gathen, Volker
  Plasma Sources Sci. Technol. 30, 015014 (2021)
  DOI: https://doi.org/10.1088/1361-6595/abd61e
  
• Micro atmospheric pressure plasma jets excited in He/O2 by voltage waveform tailoring: A study based on a numerical hybrid model and experiment
  Liu, Y., Korolov, I.; Trieschmann, J.; Steuer, D.; Schulz-von der Gathen, V.; Böke, M.; Bischoff, L.; Hübner, G.; Schulze, J.; Mussenbrock, Th.
  Plasma Sources Sci. Technol. 30, 064001 (2021)
  DOI: https://doi.org/10.1088/1361-6595/abd0e0
  
• Atomic oxygen generation in atmospheric pressure RF plasma jets driven by tailored voltage waveforms in mixtures of He and O₂
  I. Korolov, D. Steuer, L. Bischoff, G. Hübner, Y. Liu, V. Schulz-von der Gathen, M Böke, T. Mussenbrock, J. Schulze
  J. Phys. D 54, 125203 (2021)
  DOI: https://doi.org/10.1088/1361-6463/abd20e
  

2020

• Velocity distribution of metal ions in the target region of HiPIMS: the role of Coulomb collisions
  Held, Julian; Monje, Sascha; von Keudell, Achim; Schulz-von der Gathen, Volker
  Plasma Sources Sci Technol 29 (2020) 125003
  DOI: https://doi.org/10.1088/1361-6595/abbf94
  
• Reproducibility of 'COST reference microplasma jets
  F Riedel, J Golda, J Held, H L Davies, M W van der Woude, J Bredin, K Niemi, T Gans, V Schulz-von der Gathen and D O’Connell
  Plasma Sources Sci. Technol. 29 (2020) 095018
  DOI: https://dx.doi.org/10.1088/1361-6595/abad01
  
• 3-dimensional density distributions of NO in the effluent of the COST Reference Microplasma Jet operated in He/N₂/O₂
  Preissing, Patrick; Korolov, Ihor; Schulze, Julian; Schulz-von der Gathen, Volker; Böke, Marc
  Plasma Sources Sci. Technol. 29, 125001 (2020)
  DOI:
  
• Treating surfaces with a cold atmospheric pressure plasma using the COST-Jet
  Judith Golda, Kerstin Sgonina, Julian Held, Jan Benedikt, Volker Schulz-von der Gathen
  J.Vis.Exp. (165), E61801 (2020)
  DOI: https://doi.dx.org/10.379/61801
  
• Nanosecond pulsed discharges in distilled water - Part II: Line emission and plasma propagation
  von Keudell, Achim; Grosse, Katharina; Schulz-von der Gathen, Volker
  Plasma Sources Science and Technology 29, 085021 (2020)
  DOI: https://doi.org/10.1088/1361-6595/aba4b9
  
• Nanosecond pulsed discharges in distilled water - Part I: Continuum radiation and plasma ignition
  Grosse, Katharina; Schulz-von der Gathen, Volker; von Keudell, Achim
  Plasma Sources Science and Technology 29, 095008 (2020)
  DOI: https://doi.org/10.1088/1361-6595/aba487
  
• Vacuum ultraviolet spectroscopy of cold atmospheric pressure plasma jets
  Judith Golda, Beatrix Biskup, Vincent Layes, Tristan Winzer, Jan Benedikt
  Plasma Process Polym. 2020;e1900216.
  DOI: 10.1002/ppap.201900216
  
• Modular constructed metal-grid arrays - an alternative to silicon-based microplasma devices for catalytic applications
  S. Dzikowski, R. Michaud, H. Boettner, R. Dussart, M. Böke, V. Schulz-von der Gathen
  Plasma Sources Science and Technology 29 (2020) 035028
  DOI: https://doi.org/10.1088/1361-6595/ab71f6
  
• Helium metastable species generation in atmospheric pressure RF plasma jets driven by tailored voltage waveforms in mixtures of He and N₂
  Korolov,I.; Leimkühler,M.; Böke,M.; Donko,Z.; Schulz-v.d.Gathen,V.; Bischoff,L.; Hübner,G.; Hartmann,P.; Gans,T.; Liu,Y.; Mussenbrock,T; Schulze,J.
  J. Phys. D: Appl. Phys. 53 (2020) 185201
  DOI: https://doi.org/10.1088/1361-6463/ab6d97
  
• Comparison of electron heating and energy loss mechanisms in an RF plasma jet operated in argon and helium
  Golda, Judith; Held, Julian; Schulz-von der Gathen, Volker
  Plasma Sources Sci Technol 29 (2020) 025014
  DOI: https://doi.org/10.1088/1361-6595/ab6c81
  
• Study of the transition from self-organised to homogeneous plasma distribution in chromium HiPIMS discharge
  M. Slapanska, A. Hecimovic, J. Gudmundsson, J. Hnilica, W. Breilmann, P. Vasina, A. von Keudell
  J. Phys D. 53, 155201 (2020)
  DOI: https://iopscience.iop.org/article/10.1088/1361-6463/ab6a8c
  
• Excitation and dissociation of CO₂ heavily diluted in noble gas atmospheric pressure plasmas
  C. Stewig, S. Schüttler, T. Urbanietz, M. Böke, A. von Keudell
  J. Phys D 53, 125205 (2020)
  DOI: https://doi.org/10.1088/1361-6463/ab634f
  
• Pattern formation in high power impulse magnetron sputtering (HiPIMS) plasmas
  J. Held, A. von Keudell
  Plasma Chemistry Plasma Physics 40, 643 (2020)
  DOI: https://doi.org/10.1007/s11090-019-10052-3
  

2019

• Chemistry in Nanosecond plasmas in water
  L. Chauvet, C. Nenbangkaeo, K. Grosse, A. von Keudell
  Plasma Processes and Polymers 201900192 (2019)
  DOI: https://doi.org/10.1002/ppap.201900192
  
• Electron density, temperature and the potential structure of spokes in HiPIMS
  J. Held, P. Maaß, V. Schulz-von der Gathen, A. von Keudell
  Plasma Sources Sci Technol 29, 025006 (2019)
  DOI: https://doi.org/10.1088/1361-6595/ab5e46
  
• Applications of the COST Plasma Jet: More than a Reference Standard
  Y. Gorbanev, J. Golda, V. Schulz-von der Gathen and A. Bogaerts
  Plasma 2019, 2(3), 316-327
  DOI: http://doi.org/10.3390/plasma2030023
  
• Dissipated electrical power and electron density in an RF atmospheric pressure helium plasma jet
  J. Golda, F. Kogelheide, P Awakowicz, V. Schulz-von der Gathen
  Plasma Sources Sci Technol 28 (2019) 095023
  DOI: https://doi.org/10.1088/1361-6595/ab393d
  
• Nanosecond plasmas in water: ignition, cavitation and plasma parameters
  Katharina Grosse, Julian Held, Maike Kai, Achim von Keudell
  Plasma Sources Sci. Technol. 20, 085003 (2019)
  DOI: http://dx.doi.org/10.1088/1361-6595/ab26fc
  
• Nitrosylation vs. oxidation – how to modulate cold physical plasmas for biological applications
  J.-W. Lackmann, G. Bruno, H. Jablonowski, F. Kogelheide, B. Offerhaus, J. Held, V. Schulz-von der Gathen, K. Stapelmann, Th. von Woedtke, K. Wende
  PLoS ONE 14 (2109) e0216606
  DOI: 10.1371/journal.pone.0216606
  
• On the validity of neutral gas temperature by emission spectroscopy in micro-discharges close to atmospheric pressure
  Iséni, Sylvain; Michaud, Ronan; Lefaucheux, Philippe; Sretenovi?, Goran; Schulz-von der Gathen, Volker; Dussart, Remi
  Plasma Sources Science and Technology 28 (2019) 065003
  DOI: 10.1088/1361-6595/ab1dfb
  
• SiO2 microstructure evolution during plasma deposition analyzed via ellipsometric porosimetry
  R. Buschhaus, A. von Keudell
  Plasma Processes and Polymers 16, 1900015 (2019)
  DOI: https://doi.org/10.1002/ppap.201900015
  
• Validation of Etching Model of Polypropylene Layers exposed to Argon Plasmas
  Carles Corbella, Adam Pranda, Sabine Portal, Teresa de los Arcos, Guido Grundmeier, Gottlieb S. Oehrlein, and Achim von Keudell
  Plasma Processes and Polymers 16:e1900019 (2019)
  DOI: https://doi.org/10.1002/ppap.201900019
  
• Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD
  D. Kirchheim, S. Wilski, M. Jaritz, F. Mitschker, M. Oberberg, J. Trieschmann, L. Banko, M. Brochhagen, R. Schreckenberg, Chr. Hopmann, M. Böke, J. B
  Journal of Coatings Technology and Research (2019) https://doi.org/10.1007/s11998-018-0138-4
  DOI: https://doi.org/10.1007/s11998-018-0138-4
  

2018

• Experimental and computational investigations of electron dynamics in micro ap rf plasma jets operated in He/N2 mixtures
  L Bischoff, G Hübner, I Korolov, Z Donko, P Hartmann, T Gans, J Held, V Schulz-von der Gathen, Y Liu, T Mussenbrock, J Schulze
  Plasma Sources Science and Technology 27 (2018) 125009
  DOI: 10.1088/1361-6595/aaf35d
  
• Velocity distribution of titanium neutrals in the target region of high power impulse magnetron sputtering discharges
  J. Held, A. Hecimovic, A. von Keudell, V. Schulz-von der Gathen
  Plasma Sources Sci. and Technol. 27, 105012 (2018)
  DOI: https://doi.org/10.1088/1361-6595/aae236
  
• Non-equilibrium excitation of CO2 in an atmospheric pressure helium plasma jet
  T. Urbanietz, M. Böke, V. Schulz-von der Gathen, A. von Keudell
  J. Phys. D 51, 345202 (2018)
  DOI: https://doi.org/10.1088/1361-6463/aad4d3
  
• Spokes in high power impulse magnetron sputtering plasmas
  Ante Hecimovicz and Achim von Keudell
  J, Physics D 51, 453001 (2018) Topical review
  DOI: https://doi.org/10.1088/1361-6463/aadaa1
  
• Connection between target poisoning and current waveforms in reactive high power impulse magnetron sputtering of chromium
  Vincent Layes, Carles Corbella, Sascha Monjé, Volker Schulz-von der Gathen, Achim von Keudell, and Teresa de los Arcos
  Plasma Sources Sci. Technol. 27, 084004 (2018)
  DOI: https://doi.org/10.1088/1361-6595/aad0e2
  
• The Future of Plasma Science and Technology in Plastics and Textiles
  Uros Cvelbar et al.
  Plasma Process. Polym. (2018), e1700228
  DOI: https://doi.org/10.1002/ppap.201700228
  
• Chemical fingerprints of cold physical plasmas – an experimental and computational study using cysteine as tracer compound
  J-W Lackmann, Ch. Verlackt, J Golda, J Volzke, F Kogelheide, J Held, S Bekeschus, A Bogaerts, V Schulz-v d Gathen, K Stapelmann
  Scientific Reports (2018) 8:7736
  DOI: https://doi.org/10.1038/s41598-018-25937-0
  
• Influence of spokes on the Ionized Metal Flux Fraction in chromium High Power Impulse Magnetron Sputtering
  B. Biskup, C. Maszl, W. Breilmann, J. Held, M. Böke, J. Benedikt and A. von Keudell
  J. Phys. D: Appl. Phys. 51, 115201 (2018)
  DOI: https://doi.org/10.1088/1361-6463/aaac15
  
• Decoupling of Ion- and Photon-Activation Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas
  M. Budde, C. Corbella, S. Große-Kreul, T. de los Arcos, G. Grundmeier, A. von Keudell
  Plasma Process. Polym. (2018), e1700230
  DOI: https://doi.org/10.1002/ppap.201700230
  
• Direct Current microhollow cathode discharges on silicon devices operating in argon and helium
  R. Michaud, V. Felix; A. Stolz, O. Aubry, Ph. Lefaucheux, S. Dzikowski, V. Schulz-von der Gathen, L. Overzet, R. Dussart
  Plasma Sources Sci. Technol. 27 (2018) 025005
  DOI: 10.1088/1361-6595/aaa870
  
• Deposition of SiOx coatings by inductively coupled plasma: effect of pulsed hexamethyldisiloxan flow
  M. Brochhagen, S. Chur, V. Layes, M. Böke, J. Benedikt
  Plasma Process. Polym. (2018), e1700186
  DOI: https://doi.org/10.1002/ppap.201700186
  

2017

• Measurement of Ar resonance and metastable level number densities in Ar-molecular gas mixtures
  M. Fiebrandt, B. Hillebrand, S. Spiekermeier, N. Bibinov, M. Böke, and P. Awakowicz
  J. Phys. D: Appl. Phys. 50, (2017), 35520
  DOI: doi:10.1088/1361-6463/aa7d67
  
• Temperature Dependent Transport Mechanisms through PE-CVD Coatings: Comparison of Oxygen and Water Vapour
  D. Kirchheim, S. Wilski, M. Jaritz, F. Mitschker, M. Gebhard, M. Brochhagen, Chr. Hopmann, M. Böke, J. Benedikt, A. Devi, P. Awakowicz, and R. Dahlman
  J. Phys. D: Appl. Phys. 50, (2017), 395302
  DOI: doi:10.1088/1361-6463/aa80fd
  
• Influence of residual stress on the adhesion and surface morphology of PECVD coated polypropylene
  M. Jaritz, H. Behm, D. Grochla, D. Kirchheim, S. Wilski, M. Böke, A. Ludwig, J. Winter, Ch. Hopmann, and R. Dahlmann
  J. Phys. D: Appl. Phys. 50, (2017), 445301
  DOI: 10.1088/1361-6463/aa8798
  
• Probing the electron density in HiPIMS plasmas by target inserts
  Hecimovic, Ante; Held, Julian; Schulz-von der Gathen, Volker; Breilmann, Wolfgang; Maszl, Christian; von Keudell, Achim
  J. Phys D. 50 (2017) 505204
  DOI: 10.1088/1361-6463/aa9914
  
• Absolute ozone densities in a radio-frequency driven atmospheric pressure plasma using two-beam UV-LED absorption spectroscopy and numerical simulatio
  A. Wijaikhum, D. Schroeder, S. Schröter, A. Gibson, K. Niemi, J. Friderich, A. Greb, V. Schulz-von der Gathen, D. O'Connell and T. Gans
  Plasma Sources Science and Technology 26 (2017) 115004
  DOI: 10.1088/1361-6595/aa8ebb
  
• Foundations of low-temperature plasma physics - an introduction
  Achim von Keudell and Volker Schulz-von der Gathen
  Plasma Sources Science and Technology 26, 113001 (2017)
  DOI: https://doi.org/10.1088/1361-6595/aa8d4c
  
• Correlative plasma-surface model for metastable Cr-Al-N: Frenkel pair formation and influence of the stress state on the elastic properties
  Denis Music, Lars Banko, Holger Ruess, Martin Engels, Ante Hecimovic, Dario Grochla, Detlef Rogalla, Tobias Br¨ogelmann, Alfred Ludwig, Achim von Keudell
  Journal of Applied Physics 121, 215108 (2017)
  DOI:
  
• Fundamental Study of an Industrial Reactive HPPMS (Cr,Al)N Process
  K. Bobzin, T. Brögelmann, N.C. Kruppe, M. Engels, A. von Keudell, A. Hecimovic, A. Ludwig, D. Grochla, L. Banko
  J. Appl. Phys. 122, 015302 (2017)
  DOI:
  
• Correlative plasma-surface model for metastable Cr-Al-N: Frenkel pair formation and influence of the stress state on the elastic properties
  D Music, L Banko, H Ruess, M Engels, A Hecimovic, D Grochla, D Rogalla, T Brögelmann, A Ludwig, A von Keudell, K Bobzin and J M Schneider
  Journal of Applied Physics 121, 215108 (2017)
  DOI: 10.1063/1.4985172
  
• Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence
  F. Mitschker, S. Steves, M. Gebhard, M. Rudolph, L. Schücke, D. Kirchheim, M. Jaritz, M. Brochhagen, Chr. Hoppe, R. Dahlmann, M. Böke, J. Benedikt, I.
  J. Phys. D: Appl. Phys. 50, (2017), 235201
  DOI: https://doi.org/10.1088/1361-6463/aa6e28
  
• Review Article: Unraveling synergistic effects in plasma-surface processes by means of beam experiments
  A. von Keudell, C. Corbella
  J. Vac. Sci. Technol. A 35, 050801 (2017)
  DOI: http://dx.doi.org/10.1116/1.4983275
  
• Investigation of plasma spokes in reactive high power impulse magnetron sputtering discharge
  A. Hecimovic, C. Corbella, C. Maszl, W. Breilmann, A. von Keudell
  J. Appl. Phys. 121, 171915 (2017)
  DOI: http://dx.doi.org/10.1063/1.4978348
  
• Transport Mechanisms through PE-CVD Coatings: Influence of Temperature, Coating Properties and Defects on Permeation of Water Vapour
  D. Kirchheim, M. Jaritz, F. Mitschker, M. Gebhard, M. Brochhagen, Chr. Hopmann, M. Böke, A. Devi, P. Awakowicz, R. Dahlmann
  J. Phys. D: Appl. Phys. 50, (2017), 085203,
  DOI: http://dx.doi.org/10.1088/1361-6463/aa511c
  
• Species transport on the target during high power impulse magnetron sputtering
  V. Layes, S. Monje, C. Corbella,J. Trieschmann, T. de los Arcos and A. von Keudell
  Appl. Phys. Lett. 110, 081603 (2017)
  DOI: http://dx.doi.org/10.1063/1.4976999
  
• Influence of the nitrogen admixture to argon on the ion energy distribution in reactive high power pulsed magnetron sputtering of chromium
  W. Breilmann, C. Maszl, A. Hecimovic, A. von Keudell
  J. Phys. D 50 (2017) 135203
  DOI: https://iopscience.iop.org/article/10.1088/1361-6463/aa5bfc
  
• Composite targets in HiPIMS plasmas: correlation of in-vacuum XPS characterization and optical plasma diagnostics
  V. Layes, S. Monje, C. Corbella, V. Schulz-von der Gathen, A. von Keudell, T. de los Arcos
  J. Appl. Phys. 121, 171912 (2017)
  DOI: http://dx.doi.org/10.1063/1.4977820
  
• Electric potential screening on metal targets submitted to reactive sputtering
  C. Corbella, A. Marcak, T. de los Arcos, A. von Keudell
  J. Vac. Sci. Technol. A 35, 021307 (2017)
  DOI: http://dx.doi.org/10.1116/1.4972566
  
• Fast charge exchange ions in high power impulse magnetron sputtering of titanium as probes for the electrical potential
  W. Breilmann, C. Maszl, A. von Keudell
  Plasma Sources Sci. and Technol. 26, 035007 (2017)
  DOI: https://doi.org/10.1088/1361-6595/aa56e5
  

2016

• Pressure-reducing device, apparatus for mass spectrometric analysis of a gas and a cleaning method
  H.Y. Chung, M. Aliman, G. Fedosenko, R. Reuter, L. Gorkhover, P. Awakowicz, M. Böke, A. von Keudell, J. Winter, A. Laue, J. Benedikt
  Patent: WO2016/096233 A1 (2016), DE102014226038 A1 (2016)
  DOI:
  
• Ionization device and mass spectrometer therewith
  M. Aliman, H.Y. Chung, G. Fedosenko, R. Reuter, A. Laue, A. von Keudell, M. Böke, T. Benter, J. Winter, P. Awakowicz, L. Gorkhov
  Patent: WO2016096457 A1 (2016), DE102014226039 A1 (2016)
  DOI:
  
• Pressure broadening of atomic oxygen two-photon absorption laser induced fluorescence
  D. Marinov, C. Drag, Ch. Blondel, O. Guaitella, J. Golda, B. Klarenaar, R. Engeln, V. Schulz-von der Gathen, J.P. Booth
  Plasma Sources Sci. Technol. 25 (2016) 06LT03
  DOI: 10.1088/0963-0252/25/6/06LT03
  
• Methods of gas purification and effect on the ion composition in an RF atmospheric pressure plasma jet investigated by mass spectrometry
  Simon Große-Kreul, Simon Hübner, S. Schneider, A. von Keudell, J. Benedikt
  EPJ Technuiques and Instrumentations 3 : 6 (2016)
  DOI: http://dx.doi.org/10.1140/epjti/s40485-016-0034-1
  
• Two dimensional spatial Argon metastable dynamics in HiPIMS discharges
  Alexander Kanitz, Ante Hecimovic, Marc Böke and Jörg Winter
  J. Phys. D: Appl. Phys. 49 (2016) 125203 (11pp)
  DOI: http://dx.doi.org/10.1088/0022-3727/49/12/125203
  
• Anomalous cross-B field transport and spokes in HiPIMS plasma
  Hecimovic, Ante
  J. Phys. D: Appl. Phys. 49 (2016) 18LT01 (6pp)
  DOI: 10.1088/0022-3727/49/18/18LT01
  
• AbsoluteOH and O radical densities in effluent radical densities in effluent of a He/H2O micro-scaled atmospheric pressure plasma jet
  J. Benedikt, D. Schröder, S. Schneider, G. Willems, A. Pajdarova, J. Vlcek, V. Schulz-von der Gathen
  Plasma Sources Sci. Technol. 25 (2016) 045013
  DOI: 10.1088/0963-0252/25/4/045013
  
• Production of nitric/nitrous oxide by an atmospheric pressure plasma jet
  C Douat, S Hübner, R Engeln, J Benedikt
  Plasma Sources Sci. Technol. 25 (2016) 025027
  DOI: http://iopscience.iop.org/article/10.1088/0963-0252/25/2/025027/
  
• Revising secondary electron yields of ion-sputtered metal oxides
  Corbella Roca, Carles; Marcak, Adrian; de los Arcos, Teresa; von Keudell, Achim
  J. Phys. D: Appl. Phys. 49 (2016) 16LT01
  DOI: http://dx.doi.org/10.1088/0022-3727/49/16/16LT01
  
• Gepulste Hochleistungs-Magnetron-Plasmen (HPPMS), Kontrolle durch Überwachung der Strom-Spannungskennlinien
  Achim von Keudell, Ante Hecimovic, Christian Maszl
  Vakuum in Forschung und Praxis 28, 24 (2016)
  DOI:
  
• Sampling of ions at atmospheric pressure: Ion transmission and ion energy studied by simulation and experiment
  Simon Große-Kreul, Simon Hübner, Jan Benedikt, and Achim von Keudell
  Eur. Phys. J. D 70, 1-9 (2016)
  DOI: http://dx.doi.org/10.1140/epjd/e2016-60601-4
  
• Spoke rotation reversal in magnetron discharges of aluminium, chromium and titanium
  A Hecimovic, C Maszl, V Schulz-von der Gathen, M Böke and A von Keudell
  Plasma Sources Science and Technology 06/2016; 25(3):035001
  DOI: http://dx.doi.org/10.1088/0963-0252/25/3/035001
  
• Origin of microplasma instabilities during DC operation of silicon based microhollow cathode devices
  V Felix, P Lefaucheux, O Aubry, J Golda, V Schulz-von der Gathen, L J Overzet and R Dussart,
  Plasma Sources Sci. Technol. 25 (2016) 025021
  DOI: http://dx.doi.org/10.1088/0963-0252/25/2/025021
  
• Concepts and characteristics of the ''COST Reference Microplasma Jet''
  J Golda, J Held, B Redeker, M Konkowski, P Beijer, A Sobota, G. Kroesen, N. Braithwaite, S. Reuter, M. Turner, T. Gans, D. OConnel, V. Schulz-von der Gathen
  J. Phys. D: Appl. Phys. 49, 084003 (2016)
  DOI: http://dx.doi.org/10.1088/0022-3727/49/8/084003
  
• Control of high power pulsed magnetron discharge by monitoring the current voltage characteristics
  A. von Keudell, A. Hecimovic, C. Maszl
  Contrib. Plasma Phys., 1 – 9 (2016)
  DOI: https://dx.doi.org/10.1002/ctpp.201600004
  

2015

• The mechanical behavior of ALD-polymer hybrid films under tensile strain
  A. Bulusu, S. Graham, H. Bahre, H. Behm, M. Böke, R. Dahlmann, Ch. Hopmann , and J. Winter
  Adv. Eng. Mater., 17 (2015), 1057
  DOI: http://dx.doi.org/10.1002/adem.201400431
  
• Atomic oxygen dynamics in an air dielectric barrier discharge: a combined diagnostic and modeling approach
  S. Baldus, D. Schroeder, N. Bibinov, V. Schulz-von der Gathen, and P. Awakowicz
  J. Phys. D: Appl. Phys. 48 (2015) 275203
  DOI: http://dx.doi.org/10.1088/0022-3727/48/27/275203
  
• Gas and heat dynamics of a micro-scaled atmospheric pressure plasma reference jet
  S. Kelly, J. Golda , M. Turner, and V. Schulz-von der Gathen
  J. Phys. D: Appl. Phys. 48 (2015) 444002
  DOI: http://dx.doi.org/10.1088/0022-3727/48/44/444002
  
• A selective set of microscale atmospheric pressure plasma jets separates plasma produced photons and reactive particles
  S. Schneider, F. Jarzina, J.-W. Lackmann, J .Golda, V. Schulz–von der Gathen, J.E. Bandow, and J. Benedikt
  J. Phys. D: Appl. Phys. 48 (2015) 444001
  DOI: http://dx.doi.org/10.1088/0022-3727/48/44/444001
  
• Film stress of amorphous hydrogenated carbon on biaxially oriented polyethylene terephthalate
  H. Bahre, H. Behm, D. Grochla, M. Böke, R. Dahlmann, Ch. Hopmann, and J. Winter
  Plasma Process. Polym. 9, (2015), 896-904
  DOI: http://dx.doi.org/10.1002/ppap.201500045
  
• On the interplay of gas dynamics and the electromagnetic field in an atmospheric Ar/H2 microwave plasma torch
  Petr Synek, Adam Obrusnik, Simon Hübner, Sander Nijdam and Lenka Zajickova
  Plasma Sources Sci. Technol. 24 (2015) 025030
  DOI: http://dx.doi.org/10.1088/0963-0252/24/2/025030
  
• Thomson scattering on non-thermal atmospheric pressure plasma jets
  Simon Hübner, Joao Santos Sousa, Joost van der Mullen and William G Graham
  Plasma Sources Sci. Technol. 24 (2015) 054005
  DOI: http://dx.doi.org/10.1088/0963-0252/24/5/054005
  
• High power impulse sputtering of chromium: correlation between the energy distribution of chromium ions and spoke formation
  W Breilmann, A Eitrich, C Maszl, A Hecimovic, V Layes, J Benedikt, A. von Keudell
  J. Phys. D 48, 295202 (2015)
  DOI:
  
• Helium metastable density evolution in a self-pulsing micro-APPJ
  S. Spiekermeier, D. Schroeder, M. Böke, V. Schulz-von der Gathen, and J. Winter
  J. Phys. D.: Appl. Phys. 48, (2015), 035203
  DOI: http://dx.doi.org/10.1088/0022-3727/48/3/035203
  
• Characteristics of a propagating, self-pulsing, constricted gamma-mode-like discharge
  D. Schroeder, S. Burhenn, T. de los Arcos and V. Schulz-von der Gathen
  J. Phys. D.: Appl. Phys. 48, (2015), 055206
  DOI: http://dx.doi.org/10.1088/0022-3727/48/5/055206
  
• Note: Ion-induced secondary electron emission from oxidized metal surfaces measured in a particle beam reactor.
  Marcak, Adrian; Corbella, Carles; de Los Arcos, Teresa; von Keudell, Achim
  The Review of Scientific Instruments Volume 86, 106102 (2015)
  DOI: http://dx.doi.org/10.1063/1.4932309
  
• Exploring the Structure of the Modified Top Layer of Polypropylene During Plasma Treatment
  Corbella, Carles; Grosse-Kreul, Simon; von Keudell, Achim
  PLASMA PROCESSES AND POLYMERS 12, 564-573, (2015)
  DOI: http://dx.doi.org/10.1002/ppap.201400188
  
• Mass spectrometry of atmospheric pressure plasmas
  S Große-Kreul, S Hübner, S. Schneider, D Ellerweg, A von Keudell, S Matejcik and J Benedikt,
  Plasma Sources Science and Technology 24, 044008 (2015),
  DOI: http://dx.doi.org/10.1088/0963-0252/24/4/044008
  
• Spoke transitions in HiPIMS discharges
  Hecimovic, A., Schulz-von der Gathen, V., Böke, M. A. von Keudell
  Plasma Sources Science & Technology 24, 045005 (2015)
  DOI: http://dx.doi.org/10.1088/0963-0252/24/4/045005
  
• Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces
  Grundmeier, Guido; von Keudell, Achim; de los Arcos, Teresa,
  PLASMA PROCESSES AND POLYMERS 12, 926-940 (2015)
  DOI:
  
• Elementary surface processes during reactive magnetron sputtering of chromium
  Monje, Sascha; Corbella, Carles; von Keudell, Achim
  JOURNAL OF APPLIED PHYSICS Volume: 118, 133301 (2015)
  DOI: http://dx.doi.org/10.1063/1.4932150
  

2014

• Selbsttragende Spuleneinheit für eine Plasmaquelle, Verfahren zur Herstellung einer solchen Spuleneinheit und entsprechende Plasmaquelle
  P. Awakowicz M. Böke, J. Winter, A. von Ke
  Patent: DE102012109461 A1 (2014)
  DOI:
  
• Spatio-temporal dynamics of a pulsed argon plasma: ignition and afterglow
  E Carbone, N Sadeghi, E Vos, S Hübner, E van Veldhuizen, J van Dijk, S Nijdam and G M W Kroesen
  Plasma Sources Sci. Technol. 24 (2014) 015015
  DOI: http://dx.doi.org/10.1088/0963-0252/24/1/015015
  
• Argon metastable dynamics and livetimes in a DC microdischarge
  I. Stefanovic, T. Kuschel, S. Schröter, and M. Böke
  J. Appl. Phys. 116 (2014), 113302
  DOI: http://dx.doi.org/10.1063/1.4895714
  
• The Role of Argon Metastables in an Inductively Coupled Plasma for Treatment of PET
  S. Schröter, H. Bahre, M. Böke, and J. Winter
  Plasma Process. Polym. 11 (2014), 239-246
  DOI: http://dx.doi.org/10.1002/ppap.201300138
  
• Analysis of strain-induced crack formation on multi-layered barrier coatings on metal and polymer substrates
  B. Özkaya, H. Bahre, M. Böke, D. Höwer, S. Reese, J. Winter, and G. Grundmeier
  Surf. Coat. Tech. 244 (2014), 173-179
  DOI: http://dx.doi.org/10.1016/j.surfcoat.2014.02.004
  
• The characteristic shape of emission profiles of plasma spokes in HiPIMS: the role of secondary electrons
  A. Hecimovic, M. Böke, and J. Winter
  J. Phys. D: Appl. Phys. 47 (2014) 102003, fast track article - IOP select,
  DOI: http://dx.doi.org/10.1088/0022-3727/47/10/102003
  
• Adhesion of thin CVD films on pulsed plasma pre-treated polypropylene
  H. Behm, K. Bahroun, H. Bahre, F. Mitschker, N. Bibinov, M. Böke, R. Dahlmann, P. Awakowicz, Ch. Hopmann, and J. Winter
  Plasma Process. Polym. 11, (2014), 418-425
  DOI: http://dx.doi.org/10.1002/ppap.201300128
  
• Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate
  T. de los Arcos, R. Schröder, Y. A. Gonzalvo, V. Schulz-von der Gathen, and J. Winter
  Plasma Sources Sci. Technol., 23 (2014) 054008
  DOI: http://dx.doi.org/10.1088/0963-0252/23/5/054008
  
• Atomic nitrogen: a parameter study of a micro-scale atmospheric pressure plasma jet by means of molecular beam mass spectrometry
  Simon Schneider, Mario Dünnbier, Simon Hübner, Stephan Reuter and Jan Benedikt
  J. Phys. D: Appl. Phys. 47 (2014) 505203
  DOI: http://dx.doi.org/10.1088/0022-3727/47/50/505203
  
• Electron properties in an atmospheric helium plasma jet determined by Thomson scattering
  S Hübner, J Santos Sousa, V Puech, G M W Kroesen and N Sadeghi
  J. Phys. D: Appl. Phys. 47 (2014) 432001
  DOI: http://dx.doi.org/10.1088/0022-3727/47/43/432001
  
• Upscaling plasma deposition: The influence of technological parameters
  Corbella, Carles
  Surf. Coat. Technol. 242 (2014) 237-245
  DOI: http://dx.doi.org/10.1016/j.surfcoat.2013.12.002
  
• Width dependent interaction of trench-like microdischarges arranged in sub-arrays on a silicon based chip
  M.K. Kulsreshath, J. Golda, V. Schulz-von der Gathen and R. Dussart
  Plasma Sources Science Technol. 23 (2014) 045012
  DOI: http://dx.doi.org/10.1088/0963-0252/23/4/045012
  
• Ignition dynamics of dry-etched vertical cavity single hole microdischarge reactors in AC regime operating in noble gases
  M.K. Kulsreshath, J. Golda, V. Felix, V. Schulz-von der Gathen and R. Dussart,
  J. Phys. D: Appl. Phys., 47 (2014) 335202
  DOI: http://dx.doi.org/10.1088/0022-3727/47/33/335202
  
• Circular Emission and Destruction Patterns on a Silicon-Based Micro Discharge Array
  J. Golda, M.K. Kulsreshath, H. Boettner, V. Felix, R. Dussart, and V. Schulz-von der Gathen
  IEEE Trans. Plasma Sci. 42 (2014) 2646
  DOI: http://dx.doi.org/10.1109/TPS.2014.2337657
  
• Combined In Situ XPS and UHV- Chemical Force Microscopy ( CFM) Studies of the Plasma Induced Surface Oxidation of Polypropylen
  B. Ozkaya, S. Grosse-Kreul, C. Corbella, A. von Keudell, G. Grundmeier
  Plasma Processes and Polymers 11, 256 (2014)
  DOI: http://dx.doi.org/10.1002/ppap.201300105
  
• The effect of surface reactions of O, O3 and N on film properties during the growth of silica-like films
  K Rügner, R Reuter, A von Keudell and J Benedikt,
  J. Phys. D: Appl. Phys. 47 224005 (2014)
  DOI:
  
• Various Shapes of Plasma Spokes Observed in HiPIMS
  Hecimovic, Ante; von Keudell, Achim; Schulz-von der Gathen, Volker; Winter, Jörg
  IEEE TRANSACTIONS ON PLASMA SCIENCE 42, 2810-2811, (2014)
  DOI: http://dx.doi.org/10.1109/TPS.2014.2330454
  
• Fast time resolved techniques as key to the understanding of energy and particle transport in HPPMS-plasmas
  C. Maszl, W. Breilmann, L. Berscheid, J. Benedikt, A. von Keudell
  IEEE Images in Plasma Science 42, 2810 (2014)
  DOI:
  
• Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure
  Marinov, D.; Guaitella, O.; de los Arcos, T.; von Keudell, A
  JOURNAL OF PHYSICS D-APPLIED PHYSICS 47, 475204 (2014)
  DOI:
  
• Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium
  C Maszl, W Breilmann, J Benedikt and A von Keudell
  J. Phys. D: Appl. Phys. 47 224002 (2014)
  DOI:
  

2013

• Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity
  J. Winter, A. Hecimovic, T. de los Arcos, M. Böke, and V. Schulz-von der Gathen:
  J.Phys. D: Appl. Phys. 46 (2013) 084007
  DOI: http://dx.doi.org/10.1088/0022-3727/46/8/084007
  
• A non-invasive technique to determine ion fluxes and ion densities in reactive and non-reactive pulsed plasmas,
  B. Sikimic, I. Stefanovic, I.B. Denysenko, and J. Winter
  Plasma Sources Sci. Technol. 22 (2013) 045009
  DOI: http://iopscience.iop.org/0963-0252/22/4/045009/
  
• Time resolved characterization of a filamentary argon discharge at atmospheric pressure in a capillary using emission and absorption spectroscopy
  S. Schröter, R. Pothiraja, P. Awakowicz, N. Bibinov, M. Böke, B. Niermann, and J. Winter
  J. Phys. D: Appl. Phys. 46, (2013) , 464009,
  DOI: http://dx.doi.org/10.1088/0022-3727/46/46/464009%E2%80%9D
  
• Monitoring particle growth in deposition plasmas
  T. Schlebrowski, H. Bahre, M. Böke, and J. Winter
  Plasma Sources Sci. Technol. 22, (2013), 065014
  DOI: http://dx.doi.org/10.1088/0963-0252/22/6/065014
  
• Discharging of dust particles in the afterglow of plasma with large dust density
  I.B. Denysenko, I. Stefanovi?, B. Sikimi?, J. Winter, and N. A. Azarenkov
  Phys. Rev. E 88, 023104 – Published 8 August 2013
  DOI: http://pre.aps.org/abstract/PRE/v88/i2/e023104
  
• Current-voltage characteristics and fast imaging of HPPMS plasmas: transition from self-organized to homogeneous plasma regimes
  T. de los Arcos, V. Layes, Y. Aranda Gonzalvo, V. Schulz-von der Gathen, A. Hecimovic, and J. Winter
  Journal of Physics D: Applied Physics. 46, 335201 (2013)
  DOI:
  
• Surface pre-treatment for barrier coatings on polyethylene terephthalate
  H. Bahre, K. Bahroun, H. Behm, S. Steves, P. Awakowicz, M. Böke, Ch Hopmann, and J. Winter
  J. Phys. D: Appl. Phys. 46, (2013) 084012
  DOI: http://dx.doi.org/10.1088/0022-3727/46/8/084012
  
• Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum
  Will, Andreas; de los Arcos, Teresa; Corbella, Carles; Hecimovic, Ante; Machura, Patrick D; Winter, Jörg; von Keudell, Achim
  J. Phys. D: Appl. Phys. 46 (2013) 084009
  DOI: http://dx.doi.org/10.1088/0022-3727/46/8/084009
  
• Nonlinear evolution of surface morphology under shadowing
  P. Manz, N. Fedorczak, T. Dittmar, T. Baloniak, A. von Keudell
  Phys. Rev E 87, 2404 (2013)
  DOI:
  
• Ion-induced oxidation of aluminum during reactive magnetron sputtering
  O. Kreiter, S. Grosse-Kreul, C. Corbella, A. von Keudell
  J. Appl. Phys. 113, 143303 (2013)
  DOI: http://dx.doi.org/10.1063/1.4799052
  
• Target implantation and redeposition processes during high power impulse magnetron sputtering of aluminium,
  A. Will, T. de los Arcos, M. Prenzel, J. Winter, A. von Keudell,
  J. Appl. Phys. 46, 084009, (2013)
  DOI:
  
• Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment
  T. Takeuchi, C. Corbella, S. Grosse-Kreul, A. von Keudell, K. Ishikawa, H. Kondo, K. Takeda, M. Sekine, M. Hori
  J. Appl. Phys. 113, 04136, (2013)
  DOI: http://dx.doi.org/10.1063/1.4772996
  
• Time resolved measurement of film growth during HPPMS of titanium
  F. Mitschker, M. Prenzel, J. Benedikt, A. von Keudell
  J. Appl. Phys. D 46, 155204 (2013)
  DOI:
  
• Formation of crystalline gamma-Al2O3 induced by variable substrate biasing during reactive magnetron sputtering
  M. Prenzel, A. Kortmann, A. von Keudell, F. Nahif, J.M. Schneider, M. Shihab, R.P. Brinkmann
  Journal Phys D. 46, 084004 (2013)
  DOI: http://iopscience.iop.org/0022-3727/46/8/084004/article?fromSearchPage=true%E2%80%9C
  
• Ionization coefficients for argon in a micro-discharge
  Thomas Kuschel, Ilija Stefanovic, Gordana Malovic, Dragana Maric and Zoran Lj Petrovic
  Plasma Sources Sci. Technol. 22 (2013) 045001 2900
  DOI:
  
• Enhanced oxygen dissociation in a propagating constricted discharge formed in a self-pulsing atmospheric pressure microplasma jet
  Daniel Schröder, Sebastian Burhenn, Dennis Kirchheim and Volker Schulz-von der Gathen
  J. Phys. D: Appl. Phys. 46 ( 2013 ) 464003
  DOI:
  
• Time-resolved characterization of a filamentary argon discharge at atmospheric pressure in a capillary using emission and absorption spectroscopy
  Sandra Schroeter, Ramasamy Pothiraja, Peter Awakowicz, Nikita Bibinov, Marc Böke, Benedikt Niermann and Jörg Winter
  J. Phys. D: Appl. Phys. 46 (2013) 464009
  DOI: http://dx.doi.org/10.1088/0022-3727/46/46/464009
  
• Time resolved measurement of film growth during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride,
  F. Mitschker, M. Prenzel, C. Maszl, J. Benedikt, A. von Keudell
  J. Phys D 46, 495201 (2013)
  DOI:
  
• Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces
  C. Corbella, S. Grosse-Kreul, O. Kreiter, T. de los Arcos, J. Benedikt, and A. von Keudell,
  Rev. Sci. Instr. 84, 103303 (2013)
  DOI: http://dx.doi.org/10.1063/1.4826066
  
• Surface modification of Polypropylene (PP) by Ar ions and UV photons.
  S. Grosse-Kreul, C. Corbella, A. von Keudell, B. Özkaya, and G. Grundmeier
  Plasma Processes and Polymers 10, 1110 (2013)
  DOI: http://dx.doi.org/10.1002/ppap.201300078
  
• Dynamic of the growth flux at the substrate during high power pulsed magnetron sputtering (HiPIMS) of titanium
  W. Breilmann, C. Maszl, J. Benedikt, A. von Keudell,
  J. Phys. D 46, 485204 (2013)
  DOI:
  
• Bimodal substrate biasing to control-Al2O3 deposition during reactive magnetron sputtering
  M. Prenzel, A. Kortmann, A. Stein, A. von Keudell, F. Nahif, J. Schneider,
  J. Appl. Phys. 114, 113301 (2013)
  DOI: http://scitation.aip.org/content/aip/journal/jap/114/11/10.1063/1.4819227%E2%80%9C
  
• Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure
  K. Ruegner, R. Reuter, D. Ellerweg, A. von Keudell, J. Benedikt.
  Plasma Processes and Polymers 10, 1061-1073 (2013)
  DOI:
  

2012

• Durchbruch für die Plasmasterilisation
  P. Awakowicz, A. von Keudell, M. Böke, J. Winter, W. Novak, E. Semmler, R. Schmelzle
  Medizin & Technik - Ingenieurwissen für die Medizintechnik, 03/2012 (2012), 26-27
  DOI:
  
• Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges
  A. Hecimovic, T. de los Arcos, V. Schulz-von der Gathen, M. Böke, and J. Winter
  Plasma Sources Sci. Technol. 21, (2012) 035017
  DOI: http://dx.doi.org/10.1088/0963-0252/21/3/035017
  
• Plasma self-organisation in High Power Impulse Magnetron Sputtering Discharges
  A.P. Ehiasarian, A. Hecimovic, J. Winter, T. de los Arcos, R. New, V. Schulz-von der Gathen, M. Böke
  IOP Conf. Series: Materials Science and Engineering 39 (2012) 012012
  DOI: http://dx.doi.org/10.1088/1757-899X/39/1/012012
  
• High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization
  Ehiasarian, A. P.; Hecimovic, Ante; de los Arcos, T.; New, R.; Schulz-von der Gathen, Volker; Böke, Marc; Winter, J.
  Appl. Phys. Lett. 100, 114101 (2012)
  DOI: http://dx.doi.org/10.1063/1.3692172
  
• Functional plasma polymers deposited in capacitivley and inductively couped plasmas
  D. Hegeman, E. Koerner, C. Shang, J. Benedikt, A. von Keudell
  Appl. Phys. Lett. 100, 051601 (2012)
  DOI:
  
• Unexpected O and O3 production in the effluent of He/O2 microplasma jets emanating into ambient air
  D. Ellerweg, A. von Keudell and J. Benedikt
  Plasma Sources Science and Technol. 21, 034019 (2012)
  DOI:
  
• The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure
  Rüdiger Reuter, Katja Rügner, Dirk Ellerweg, Teresa de los Arcos, Achim von Keudell, Jan Benedikt
  Plasma Processes and Polymers (2012) DOI: 10.1002/ppap.201100146
  DOI:
  
• Quadrupol Masspectrometry of Reactive Plasmas (review)
  J. Benedikt, D. Ellerweg, A. Hecimovic, A. von Keudell
  J. Phys. D 45, 403001 (2012)
  DOI:
  
• Chemical and Physical Sputtering of PET
  S. Große-Kreul, C. Corbella, A. von Keudell
  Plasma Processes and Polymers DOI 10.1002/201200094 (2012)
  DOI: http://dx.doi.org/10.1002/ppap.201200094
  
• Time resolved measurement of film growth during HPPMS of titanium: the rotating shutter concept
  F. Mitschker, M. Prenzel, J. Benedikt, A. von Keudell
  J. Phy. D Fast Track Communications 45, 4020001 (2012)
  DOI:
  
• Application of a mode-locked fiber laser for highly time resolved broadband absorption spectroscopy and laser assisted breakdown on micro-plasmas
  B. Niermann, I.L. Budunoglu, K. Gurel, M. Böke, F.O. Ilday, and J. Winter
  J. Phys. D: Appl. Phys. 45, (2012) 245202
  DOI: http://dx.doi.org/10.1088/0022-3727/45/24/245202
  
• Atomic oxygen in a cold argon plasma Jet: TALIF spectroscopy in ambient air with modelling and measurements of ambient species diffusion
  S Reuter, J Winter, A Schmidt-Bleker, D Schroeder, H Lange, N Knake, V Schulz-v.d.Gathen, K-D Weltmann
  Plasma Sources Sci. Technol. 21 (2012) 024005
  DOI:
  
• Influence of target surfaces on the atomic oxygen distribution in the effluent of a micro-scaled atmospheric pressure plasma jet
  D Schröder, H Bahre, N Knake, J Winter, T de los Arcos and V Schulz-von der Gathen
  Plasma Sources Sci. Technol. 21 (2012) 024007
  DOI:
  
• Argon metastable dynamics in a filamentary jet micro-discharge at atmospheric pressure
  B. Niermann, R. Reuter, T. Kuschel, J. Benedikt, M. Böke, and J. Winte
  Plasma Sources Sci. Technol. 21 (2012),034002
  DOI: http://dx.doi.org/10.1088/0963-0252/21/3/034002
  
• Embedded argon as a tool for sampling local structure in thin plasma deposited aluminum oxide films,
  M. Prenzel, A. Kortmann, T. de los Arcos, J. Winter, A. von Keudell,
  J. Appl. Phys 45, 103306 (2012)
  DOI:
  

2011

• X-ray photoelectron spectroscpy on imlanted argon as a tool to follow local structral changes in thin films
  A. Rastgoo, T. de los Arcos, M. Prenzel, A. von Keudell, J. Winter
  Thin Solid Films 520, 1625 (2011)
  DOI:
  
• Surface reactions as carbon removal mechanism in deposition of silicon dioxide films at atmospheric pressure
  R. Reuter, D. Ellerweg, A. von Keudell, J. Benedikt
  Appl. Phys. Lett. 98, 111502 (2011)
  DOI:
  
• Impurity intrusion in radio-frequency micro-plasma jets operated in ambient air
  B. Niermann, A. Kanitz, M, Böke, and J. Winter
  J. Phys. D: Appl. Phys. 44, (2011) 325201
  DOI: http://dx.doi.org/10.1088/0022-3727/44/32/325201
  
• Oscillation modes of dc microdischarges with parallel-plate geometry
  Ilija Stefanovic, Thomas Kuschel, Nikola Zkoro, Dragana Maric, Zoran Lj Petrovic and Jörg Winter
  J. Appl. Phys. vol. 110, Issue 8, 083310
  DOI:
  
• Spatial dynamics of helium metastables in sheath or bulk dominated rf micro-plasma jets
  B. Niermann, T. Hemke, N.Y. Babaeva, M. Böke, R.P. Brinkmann, M.J. Kushner, T. Mussenbrock, and J. Winter
  J. Phys. D: Appl. Phys. 44 (2011) 485204
  DOI: http://dx.doi.org/10.1088/0022-3727/44/48/485204
  
• Excitation dynamics of a kHz driven micro-structured plasma channel device operated in argon
  A Greb, H Boettner, J Winter and V Schulz-von der Gathen
  Plasma Sources Sci. Technol. 20 (2011) 055010
  DOI:
  
• The role of VUV radiation in the inactivation of bacteria with an atmospheric pressure plasma jet
  S. Schneider, J.-W. Lackmann, D. Ellerweg, B. Denis, F. Narberhaus, J.E. Bandow, J. Benedikt
  Plasma Process. Polym. (2011) accepted
  DOI:
  
• Separation of VUV/UV photons and reactive particles in the effluent of a He/O2 atmospheric
  S. Schneider, J.-W. Lackmann, F. Narberhaus, J. E. Bandow, B. Denis, J. Benedikt
  J. Phys. D: Appl. Phys. 44 (2011) 295201
  DOI:
  
• Spatiotemporal profile of emission from oscillating dc microdischarges
  T. Kuschel, I. Stefanovic, N. Zkoro, D. Maric, G. Malovic, J. Winter, Z. Lj. Petrovic
  IEEE Trans. Plasma Sci., Spec. Issue on Images in Plasma Sci.
  DOI:
  
• Axial light emission and Ar metastable densities in a parallel plate dc micro discharge in steady state and transient regimes
  T. Kuschel, B. Niermann, I. Stefanovic, M. Böke, N. Zkoro, D. Maric, Z. Lj. Petrovic, and J. Winter
  Plasma Sources Sci. Technol. 2011 20 065001
  DOI: http://dx.doi.org/10.1088/0963-0252/20/6/065001
  
• Vacuum Ultraviolet (VUV) Emission of an Atmospheric Pressure Plasma Jet (micro-APPJ) Operated in Helium-Oxygen Mixtures in Ambient Air
  H. Bahre, H.Lange, V. Schulz-von der Gathen, R. Foest
  Acta Technica, 56 (2011) T199
  DOI:
  

2010

• A Physicist’s Perspective on “Views on Macroscopic Kinetics of Plasma Polymerisation”
  A. von Keudell, J. Benedikt
  Plasma Processes and Polymers 7, (2010)
  DOI:
  
• Elimination of biological contaminations from surfaces by plasma discharges: the importance of chemical sputtering
  H. Rauscher, O. Kylian, J. Benedikt, A. von Keudell, F. Rossi
  Chem Phys. Chem. 11, 1382 (2010)
  DOI:
  
• Fundamental aspects of substrate biasing: ion velocity distributions and nonlinear effects
  T. Baloniak, R. Reuter, A. von Keudell
  J. Phys. D 43, 335201 (2010)
  DOI:
  
• Calibration of a miniaturized retarding field analyzer for low-temperature plasmas: geometry and collisional effects
  T. Baloniak, R. Reuter, C. Flötgen, A. von Keudell
  J. Phys. D 43, 55203 (2010)
  DOI:
  
• Ion-enhanced oxidation of aluminium as a fundamental surface process during target poisoning in reactive magnetron sputtering
  Thomas Kuschel and Achim von Keudell
  Journal of Applied Physics 107, 103302 (2010)
  DOI:
  
• Inactivation of bacteria and biomolecules using low pressure plasma discharges (BIODECON review)
  A. von Keudell, P. Awakwowicz, J. Benedikt, V. Raballand, A. Yanguas-Gil, J. Opretzka, C. Flötgen, R. Reuter L. Byelykh, H. Halfmann, K. Stapelmann, B
  Plasma Processes and Polymers 7, 327 (2010)
  DOI:
  
• Chaotic behavior of dc microdischarges with parallel-plate geometry
  Ilija Stefanovic, Nikola Zkoro, Dragana Maric and Zoran Lj. Petrovic
  20th ESCAMPIG, 13-17 July 2010, Novi Sad, Serbia P3.41
  DOI:
  
• Space resolved density measurements of argon and helium metastable atoms in radio-frequency generated He-Ar micro-plasmas
  B. Niermann, M. Böke, N. Sadeghi and J. Winter
  Eur. Phys. J. D 60, (2010) 489-495
  DOI: http://dx.doi.org/10.1140/epjd/e2010-00166-8
  
• Gas flow dependence of ground state atomic oxygen in plasma needle discharge at atmospheric pressure
  Yukinori Sakiyama, Nikolas Knake, Daniel Schröder, Jörg Winter, Volker Schulz-von der Gathen, and David B. Graves
  Appl. Phys. Lett. 97 (2010) 151501
  DOI:
  
• Phase resolved optical emission spectroscopy of coaxial microplasma jet operated with He and Ar
  J. Benedikt, S. Hofmann, N. Knake, H. Böttner, R. Reuter, A. von Keudell, and V. Schulz-von der Gathen
  Eur. Phys. J. D (2010) 60 539
  DOI:
  
• Atomic oxygen formation in a radio-frequency driven micro-atmospheric pressure plasma jet
  J Waskoenig, K Niemi, N Knake, L M Graham, S Reuter, V Schulz-von der Gathen and T Gans
  Plasma Sources Sci. Technol. 19 (2010) 045018
  DOI:
  
• Excitation dynamics of micro-structured atmospheric pressure plasma arrays
  H. Boettner, J. Waskoenig, T. L. Kim, P. A. Tchertchian, D. O'Connell, J. Winter, and V. Schulz-von der Gathen
  J. Phys. D: Appl. Phys. 43, (2010) 124010
  DOI:
  
• Investigations of the spatio-temporal build-up of atomic oxygen inside the micro-scaled atmospheric pressure plasma jet
  N. Knake and V. Schulz-von der Gathen
  Eur. Phys. J. D 60, (2010) 645
  DOI:
  
• Characterization of the effluent of a He/O2microscale atmospheric pressure plasma jet by quantitative molecular beam mass spectrometry
  D. Ellerweg, J. Benedikt and A von Keudell N. Knake and V. Schulz-von der Gathen
  New J. Physics 12, 013021 (2010)
  DOI:
  
• Plasma enhanced chemical vapor deposition of wear resistant gradual a-Si1-x:Cx:H coatings on nickel-titanium for biomedical applications
  B. Niermann, M. Böke, J.-C. Schauer, and J. Winter
  J. Appl. Phys. 107, (2010) 053301
  DOI: http://dx.doi.org/10.1063/1.3310641
  
• The challenge of revealing and tailoring the dynamics of radio-frequency plasmas
  T. Gans, D. O'Connell, V. Schulz- von der Gathen, and J. Waskoenig
  Plasma Sources Sci. Technol. 19, (2010) 034010
  DOI:
  
• Investigations on the Generation of Atomic Oxygen Inside a Capacitively Coupled Atmospheric Pressure Plasma Jet
  N. Knake, D. Schröder, J. Winter and V. Schulz-von der Gathen
  J. Phys.: Conference Series 227 (2010) 012020
  DOI:
  
• Diagnostic based modelling of radio-frequency driven atmospheric pressure plasmas
  K. Niemi, S. Reuter, L.M. Graham, J. Waskoenig, N. Knake, V. Schulz-von der Gathen, and T. Gans
  J. Phys. D: Applied Physics 43 (2010) 124006
  DOI:
  

2009

• Optimised plasma absorption probe for the electron density determination in reactive plasmas
  C. Scharwitz, M. Böke, and J. Winter
  Plasma Process. Polym. 6, (2009) 76 – 85
  DOI: http://dx.doi.org/10.1002/ppap.200800073
  
• Practical implementation of a two-hemisphere plasma absorption probe
  C. Scharwitz, M. Böke, J. Winter, M. Lapke, T. Mussenbrock, and R. P. Brinkmann
  Appl. Phys. Lett. 94, (2009) 011502
  DOI: http://dx.doi.org/10.1063/1.3055609
  
• Characterization of single diamond-like and polymer-like nanoparticles by mid infrared nanospectroscopy
  J.-S. Samson, R. Meißner, E. Bründermann, M. Böke, J. Winter, and M. Havenith
  J. Appl. Phys. 105, (2009) 064908
  DOI: http://dx.doi.org/10.1063/1.3086650
  
• The role of C2H4 for the acetylene chemistry in particle forming Ar/He/C2H2 plasma studied via quantitative mass spectrometry
  A. Consoli, J. Benedikt, A. von Keudell
  Plasma Sources Science and Technology 18, 34004 (2009)
  DOI:
  
• Removal of model proteins using beams of argon ions and of oxygen atoms and molecules: mimicking the action of low-pressure Ar/O2 ICP discharges
  O. Kylián, J. Benedikt, L. Sirghi, R. Reuter, H. Rauscher, A. von Keudell and F. Rossi
  Plasma Processes and Polymers 6, 255 (2009)
  DOI:
  
• Thin film growth from a low pressure plasma excited in a supersonic expanding gas jet
  C. Wachtendorf, C. Herweg, M. Daeuber, J. Benedikt, A. von Keudell
  78 J. Phys. D 42, 95205 (2009)
  DOI:
  
• Molecular beam sampling system with very high beam-to-background ratio: the rotating skimmer concept
  J. Benedikt, D. Ellerweg, A. von Keudell
  Review of Scientific Instruments 80, 55107 (2009)
  DOI:
  
• Deposition of silicon dioxide using an atmospheric microplasma jet
  V. Raballand, J. Benedikt, M. Zimmermann, A. von Keudell
  J. Appl. Phys. 105, 83304 (2009)
  DOI:
  
• Development of an in-situ ellipsometer for the use at the first wall of a tokamak
  T. Dittmar, A. von Keudell, A. Kreter
  Nuclear Fusion 49, 045004 (2009)
  DOI:
  

2008

• Etching of Bacillus atrophaeus by oxygen atoms, molecules and argon ions
  J. Benedikt, C. Flötgen, G. Kussel, V. Raballand, A. von Keudell
  J. Phys. Conference Series 133, 012012 (2008)
  DOI:
  
• Initial polymerization reactions in particle forming Ar/He/C2H2 plasmas studied via quantitative mass spectrometry
  A. Consoli, J. Benedikt, A. von Keudell
  J. Phys. Chem. A 112, 11319 (2008)
  DOI:
  
• Inactivation of Bacillus Atrophaeus and of Aspergillus Niger using beams of argon ions, of oxygen molecules and of oxygen atoms
  V. Raballand, J. Benedikt, J. Wunderlich, A. von Keudell
  J. Phys. D 41, 115207 (2008)
  DOI:
  
• Anomalous roughness scaling of well-ordered amorphous fuorocarbon films deposited from a dusty octafluorocyclobutane plasma
  T. Baloniak, A. von Keudell
  Plasma Processes and Polymers 5, 653 (2008)
  DOI:
  
• Deposition of carbon free silicon dioxide from pure hexamethyldisiloxane using an atmospheric microplasma jet
  V. Raballand, J. Benedikt, A. von Keudell
  Appl. Phys. Lett. 92, 91502, (2008)
  DOI:
  
• Spatial dynamics of the light emission from a microplasma array
  J. Waskoenig, D. O'Connell, V. Schulz-von der Gathen, J. Winter, S.J. Park, and J.G. Eden,
  Appl. Phys. Lett. 92, (2008) 101503
  DOI:
  
• Absolute atomic oxygen density profiles in the discharge core of a micro scale atmospheric pressure plasma jet
  Nikolas Knake, Kari Niemi, Stephan Reuter, Volker Schulz-von der Gathen, and Jörg Winter
  Appl. Phys. Lett. 93, (2008) 131503
  DOI:
  

2007

• Modeling and simulation of the plasma absorption probe
  M. Lapke, T. Mussenbrock, and R. P. Brinkmann, C. Scharwitz, M. Böke, and J. Winter
  Appl. Phys. Lett. 90, (2007) 121502
  DOI: http://dx.doi.org/10.1063/1.2714202
  
• Experimental characterization of the plasma absorption probe
  C. Scharwitz, M. Böke, S. Hong, and J. Winter
  Plasma Process. Polym. 4, (2007) 605-611
  DOI: http://dx.doi.org/10.1002/ppap.200700047
  
• Thin film deposition by means of atmospheric pressure microplasmas
  J. Benedikt, V. Raballand A. Yanguas-Gil, K. Focke, A. von Keudell
  Plasma Physics and Controlled Fusion 49, 419 (2007)
  DOI:
  
• Time resolved molecular beam mass spectrometry of the initial stage of particle formation in an Ar/He/C2H2 plasma
  J. Benedikt, A. Consoli, M. Schulze, A. von Keudell
  J. Phys. Chem. A 111, 10453 (2007)
  DOI:
  
• Rotation of a Nanoparticle Cloud in an Inductively Coupled Plasma induced by weak static magnetic fields
  M. Schulze, D. O’Connell, T. Gans, A. von Keudell, P. Awakowicz
  Plasma Sources Science and Technology 16, 774 (2007)
  DOI:
  
• A robust method to calculate metastable and resonant state densities from emission spectra in argon plasmas
  M. Schulze, A. Yanguas-Gil, A. von Keudell, P. Awakowicz
  J. Phys. D 41, 65206 (2007)
  DOI:
  
• Heating of a dual frequency capacitively coupled plasma via the plasma series resonance
  E. Semmler, P. Awakowicz, A. von Keudell
  Plasma Sources Science and Technology 16, 839 (2007)
  DOI:
  
• The role of Chemical Sputtering during plasma sterilization of bacillus atrophaeus
  J. Opretzka, J. Benedikt, P. Awakowicz, J. Wunderlich, A. von Keudell
  J. Physics D 40, 2826 (2007)
  DOI:
  
• Optical and Electrical Characterization of a microplasma jet operated at atmospheric pressure
  A. Yanguas-Gil, K. Focke, J. Benedikt, A. von Keudell
  J. Appl. Phys. 101, 103307 (2007)
  DOI:
  
• The search for growth precursors in reactive plasmas: from nanoparticles to microplasmas
  A. von Keudell, I. Kim, A. Consoli, M. Schulze, A. Yanguas-Gil, J. Benedikt
  Plasma Sources Sci. Technol. 16, S94 (2007)
  DOI:
  

2006

• The European summer school 'Low temperature plasma physics: Basics and Applications' and ' master class: Biotechnical and medical applications
  M. Böke, and J. Winter
  Editorial, Plasma Sources Sci Technol. 15, (2006) 4
  DOI: http://dx.doi.org/10.1088/0963-0252/15/4/E01
  
• Terahertz time-domain spectroscopy as a new tool for the characterisation of dusty plasmas
  S. Ebbinghaus, K. Schröck, M. Heyden, E. Bründermann, G. Schwaab, M. Havenith, J.C. Schauer, M. Böke, J. Winter, and M. Tani
  Plasma Sources Sci. Technol. 15 (2006) 72
  DOI: http://dx.doi.org/10.1088/0963-0252/15/1/011
  
• Atmospheric microplasma jet source as depositing tool
  J. Benedikt, K. Focke, A. Yanguas-Gil, A- von Keudell
  Appl. Phys. Lett. 89, 251504 (2006)
  DOI:
  
• Roughness evolution during growth of a-C:H films in methane plasmas
  I. Kim, S. Hong, A. Consoli, J. Benedikt, A. von Keudell
  J. Appl. Phys. 100, 53302 (2006)
  DOI:
  
• Controlled Particle Formation in an inductively coupled Plasma
  M. Schulze, A. von Keudell, P. Awakowicz
  Appl. Phys. Lett. 88, 141503 (2006)
  DOI:
  
• Characterization of a rotating nanoparticles cloud in inductively coupled plasma
  M. Schulze, A. von Keudell, P. Awakowicz
  Plasma Sources Science and Technol. 15, 556 (2006)
  DOI:
  
• Modelling of pulsed low-pressure plasmas and comparison with measurements in inductive discharges
  G. Wenig, M. Schulze, P. Awakowicz, A. von Keudell
  Plasma Sources Sci. and Technol. 15, S35 (2006)
  DOI:
  

2005

• Wettabilities of plasma deposited polymer films
  K. Kutasi, N. Bibinov, A. von Keudell, K. Wiesemann
  J. Optoelectronics and Advanced Materials 7, 2549 (2005)
  DOI:
  
• Growth precursor in a pulsed inductively coupled methane plasma
  M. Bauer, T. Schwarz-Selinger, W. Jacob, A. von Keudell
  J. Appl. Phys. 98, 073302 (2005)
  DOI:
  
• Plasma chemistry of a pulsed inductively coupled methane plasma
  M. Bauer, T. Schwarz-Selinger H. Kang, A. von Keudell
  Plasma Sources Sci. Technol. 14, 543 (2005)
  DOI:
  
• Ion-induced surface activation and hydrogen release during plasma-assisted hydrocarbon film growth
  C. Hopf, W. Jacob, A. von Keudell
  J. Appl. Phys. 97, 94904 (2005)
  DOI:
  

2004

• Elementary processes in plasma-surface interaction:H-atom and ion-induced chemisorption of methyl on hydrocarbon filmsurfaces (review)
  A. von Keudell, W. Jacob
  Progress in Surface Science 26, 21-54 (2004)
  DOI:
  
• Particle induced oscillations in inductively coupled plasmas
  A. von Keudell, M. Bauer
  Plasma Sources Sci. Technol. 13, 1 (2004)
  DOI:
  

2003

• Particle beam experiment to study heterogeneous surface reactions relevant to plasma-assisted thin film growth and etching
  W. Jacob, C. Hopf, A. von Keudell, M. Meier, T. Schwarz-Selinger
  Rev. Sci. Instr. 74, 5123 (2003)
  DOI:
  
• Direct verification of the ion-neutral synergism during hydrocarbon film growth
  C. Hopf, A. von Keudell, W. Jacob
  J. Appl. Phys. 93, 3352 (2003)
  DOI:
  
• The influence of hydrogen ion bombardment on plasma-assisted hydrocarbon film growth
  C. Hopf, A. von Keudell, W. Jacob
  Diamond and Related Materials 12, 85 (2003)
  DOI:
  
• Consequences of the Temperature and flux dependent sticking coeffcient of CH3 for nuclear fusion
  M. Meier, A. von Keudell, W. Jacob
  Nucl. Fusion 43, 25 (2003)
  DOI:
  
• Chemical Sputtering of C:H films
  C. Hopf, A. von Keudell, W. Jacob
  J. Appl. Phys. 94, 2373 (2003)
  DOI:
  
• Characterization of deposited hydrocarbon layers below the divertor and in the pumping ducts of ASDEX Upgrade
  M. Mayer, V. Rohde, A. von Keudell, and the ASDEX Upgrade team
  J. Nucl. Mater. 313-316, 429 (2003)
  DOI:
  
• Can plasma experiments unravel microscopic surface processes in thin film growth and erosion ? – Implications of particle-beam experiments on the unde
  T. Schwarz-Selinger, M. Meier, C. Hopf, A. von Keudell, and W. Jacob
  Vacuum 71, 361 (2003)
  DOI:
  

2002

• Advantages of the optical cavity substrate for real time infrared spectroscopy of plasma–surface interactions
  A. von Keudell, J. Abelson
  Journal of Applied Physics 91, 4840 (2002)
  DOI: https://doi.org/10.1063/1.1456963
  
• Chemical Sputtering of C:H films by low energy argon ion and H atom impact
  C. Hopf, A. von Keudell, W. Jacob
  Nuclear Fusion 42, L27 (2002)
  DOI:
  
• Growth Mechanisms of amorphous hydrogenated carbon
  A. von Keudell, M. Meier, C. Hopf
  Diamond and Related Materials 11, 969 (2002)
  DOI:
  
• Temperature dependence of the methyl sticking coefficient on hydrocarbon film surfaces
  M. Meier, A. von Keudell
  J. Chem. Phys. 116, 5125 ( 2002)
  DOI:
  
• Formation of polymer-like hydrocarbon films from radical beams of methyl and atomic hydrogen (invited review)
  A. von Keudell
  Thin Solid Films 402, 1 (2002)
  DOI:
  

2001

• Hydrogen elimination as a key step for the formation of polymer-like hydrocarbon films
  M. Meier, A. von Keudell
  J. Appl. Phys. 90, 3585 (2001)
  DOI:
  
• Simultaneous interaction of methyl radicals and atomic hydrogen with amorphous hydrogenated carbon films, as investigated with optical in situ diagnos
  A. von Keudell, M. Meier, T. Schwarz-Selinger
  Appl. Phys. A72, 551 (2001)
  DOI:
  
• Surface reactions of hydrocarbon radicals: suppression of the re-deposition in fusion experiments via a divertor liner
  A. von Keudell, T. Schwarz-Selinger, W. Jacob, A. Stevens
  J. Nucl. Mater. 290-293, 231 (2001)
  DOI:
  
• Simultaneous interaction of methyl radicals and atomic hydrogen with amorphous hydrogenated carbon films
  A. von Keudell, T. Schwarz-Selinger, W. Jacob
  J. Appl. Phys. 89, 2979 (2001)
  DOI:
  
• Quantification of a radical beam source for methyl radicals
  T. Schwarz-Selinger, V. Dose, W. Jacob, A. von Keudell
  J. Vac. Sci. Technol. A 19, 101 (2001)
  DOI:
  

2000

• Infrared Analysis of thin films: amorphous, hydrogenated carbon on silicon
  W. Jacob, A. von Keudell, T. Schwarz-Selinger
  Brazilian Journal of Physics 30, 508 (2000)
  DOI:
  
• Thermal conductivity of amorphous carbon thin films
  A. J. Bullen, K. E. O'Hara, D. G. Cahill, O. Monteiro, A. von Keudell
  J. Appl. Phys. 88, 6317 (2000)
  DOI:
  
• Surface processes during thin film growth, Tutorial for the ERASMUS Summer School on low temperature plasma physics
  A. von Keudell
  Plasma Sources Science and Technology 9, 455-467 (2000)
  DOI:
  
• A novel method for the absolute quantification of the flux and angular distribution of a radical source for atomic hydrogen
  T. Schwarz-Selinger, A. von Keudell, W. Jacob
  J. Vac. Sci. Technol. A 18, 995 (2000)
  DOI:
  
• Direct identification of the synergism between methyl radicals and atomic hydrogen during growth of amorphous hydrogenated carbon films
  A. von Keudell , T. Schwarz-Selinger, M. Meier, W. Jacob
  Appl. Phys. Letters. 76(6):676-678, (2000) corrigendum, Appl. Phys. Lett. 77, 459 (2000)
  DOI:
  
• Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces
  C. Hopf, T. Schwarz-Selinger, W. Jacob, A. von Keudell
  J. of Appl. Physics. 87(6):2719-2725, (2000)
  DOI:
  

1999

• Modulation Instabilities of Surface-Wave Sustained Discharges
  M. Böke, D. Grozev, G. Himmel, K. Kirov, H. Schlüter and A. Shivarova
  Advanced Technologies based on Wave and Beam generated Plasmas, ed. by H. Schlüter and A. Shivarova , NATO Science Series vol. 67 (1999) 505, ISBN 0-
  DOI:
  
• Axial variation of line emission from surface wave sustained discharges
  M. Böke, G. Himmel, I. Koleva, and M. Schlüter
  J. Phys. D: Appl. Phys. 32, (1999) 2426-2432
  DOI: http://dx.doi.org/10.1088/0022-3727/32/18/314
  
• Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces: consequences for the formation of re-deposited laye
  A. von Keudell, C. Hopf, T. Schwarz-Selinger, W. Jacob
  Nuclear Fusion. 39(10):1451-1462, (1999)
  DOI:
  
• Surface loss probabilities of the dominant neutral precursors for film growth in methane and acetylene discharges
  C. Hopf, K. Letourneur, W. Jacob, T. Schwarz-Selinger, A. von Keudell
  Appl. Phys. Lett. 74, 3800 (1999)
  DOI:
  
• Plasma chemical vapor deposition of hydrocarbon films: the influence of hydrocarbon source gas on the film properties
  T. Schwarz-Selinger, A. von Keudell, W. Jacob
  J. Appl. Phys. 86, 3988 (1999)
  DOI:
  
• Erosion of Thin Hydrogenated Carbon Films in Oxygen, Oxygen/Hydrogen and Water Plasmas
  B. Landkammer, A. von Keudell, W. Jacob
  J. Nucl. Mater. 264, 48 (1999)
  DOI:
  
• Direct insertion of SiH3 radicals into strained Si-Si surface bonds during plasma deposition of hydrogenated amorphous silicon films
  A. von Keudell, J.R. Abelson
  Phys. Rev. B. 59, 5791 (1999)
  DOI:
  
• Thermally induced changes in the hydrogen microstructure of a-Si:H, analyzed using in situ real time infrared spectroscopy
  A. von Keudell, J.R. Abelson
  Jpn. J. Appl . Phys. 38, 4002 (1999)
  DOI:
  

1998

• Structure of plasma-deposited amorphous hydrogenated boron-carbon thin films
  A. Annen, M. Saß, R. Beckmann, A. von Keudell, W. Jacob
  Thin Solid Films 312, 147 (1998)
  DOI:
  
• The interaction of atomic hydrogen with very thin amorphous hydrogenated silicon films analyzed using in situ real time infrared spectroscopy: reactio
  A. von Keudell, J.R. Abelson
  J. App. Phys. 84, 489 (1998)
  DOI:
  

1997

• Evidence for atomic H insertion into strained Si-Si bonds in the amorphous hydrogenated silicon sub-surface from in situ infrared spectroscopy
  Achim von Keudell, J.R. Abelson
  Appl. Phys. Lett. 71, 3832 (1997)
  DOI:
  
• Surface relaxation during plasma chemical vapor deposition of diamond-like carbon films, investigated by in situ ellipsometry
  A. von Keudell, T. Schwarz-Selinger, W. Jacob
  Thin Solid Films 308-309, 195 (1997)
  DOI:
  
• Multivariate analysis of noise corrupted PECVD data
  A. von Keudell, A. Annen, V. Dose
  Thin Solid Films 307, 65 (1997)
  DOI:
  
• Surface reactions during plasma enhanced chemical vapor deposition of hydrocarbon films
  A. von Keudell
  Nucl. Instr. Mat. B125, 323 (1997)
  DOI:
  
• The interaction of hydrogen plasmas with hydrocarbon films, investigated by infrared spectroscopy using an optical cavity substrate
  A. von Keudell, W. Jacob
  J. Vac. Sci. Technol. A15, 402 (1997)
  DOI:
  
• Surface relaxation during plasma enhanced chemical vapor deposition of a-C:H films, investigated by in situ ellipsometry
  A. von Keudell, W. Jacob
  J. Appl. Phys. 81, 1531 (1997)
  DOI:
  

1996

• Erosion of amorphous hydrogenated boron-carbon thin films
  A. Annen, A. von Keudell, W. Jacob
  Journal of Nuclear Mat. 231, 151 (1996)
  DOI:
  
• Secondary Electron Emission Coefficient of C:H and Si:C Thin Films and Some Relations to their Morphology and Composition
  S. Groudeva--Zotova, W. Jacob, and A. von Keudell
  Diam.Rel.Mater. 5, 1087 (1996)
  DOI:
  
• Growth and Erosion of Hydrocarbon films, investigated by in-situ ellipsometry
  A. von Keudell, W. Jacob
  J. Appl. Phys. 79, 1092 (1996)
  DOI:
  

1995

• Mechanisms of the deposition of hydrogenated carbon films
  W. Möller, W. Fukarek, K. Lange, A. v. Keudell, W. Jacob
  Jpn. J. Appl. Phys. 34, 2163 (1995)
  DOI:
  
• The role of ions for the deposition of hydrocarbon films, investigated by in-situ ellipsometry
  A. von Keudell
  MRS-Proceedings, Spring ‘95, ed. H.A. Atwater, D.H. Lowdnes, J.T. Dickinson, A. Polman.
  DOI:
  
• The role of hydrogen ions during plasma enhanced chemical vapour deposition of hydrocarbon films, investigated by in-situ ellipsometry
  A. von Keudell, W. Jacob, W. Fukarek
  Appl. Phys. Lett. 66, 1322 (1995)
  DOI:
  
• A novel set-up for spectroscopic ellipsometry and an example for its application
  W. Fukarek, A. von Keudell
  Rev. Sci. Instr. 66, 3545 (1995)
  DOI:
  

1994

• A combined plasma-surface model for the deposition of C:H films from a methane plasma
  A. von Keudell, W. Möller
  J. Appl. Phys. 75, 7718 (1994)
  DOI:
  

1993

• Moving-coil waveguide discharge for inner coating of metal tubes
  R. Hytry, W. Möller, R. Wilhelm, A. von Keudell
  J. Vac. Sci. Technol. A11(5), 2508 (1993)
  DOI:
  
• Deposition of dense C:H-films at elevated substrate temperature
  A. von Keudell, W. Möller, R. Hytry
  Diamond and Related Materials 2, 251 (1993)
  DOI:
  
• Deposition of dense hydrocarbon films from a nonbiased microwave plasma
  A. von Keudell, W. Möller, R.Hytry
  Appl. Phys. Lett. 62, 937 (1993)
  DOI:
  

1992

1991

• Funktion
  A. von Keudell
  Amstrad PC International 70 - 6/7
  DOI:
  

1990

1989